Surface-micromachined 2D optical scanners with optically flat single-crystalline silicon micromirrors

被引：0

作者：

Su, GDJ ^{[1
]}

Patterson, PR ^{[1
]}

Wu, MC ^{[1
]}

机构：

[1] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA

来源：

SILICON-BASED AND HYBRID OPTOELECTRONICS III | 2001年 / 4293卷

关键词：

micromirrors; bonding; microelectromechanical devices; optical scanners; silicon on insulator; deep reactive ion etching; honeycomb;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have developed a novel wafer-scale single-crystalline silicon micromirror bonding process to fabricate optically flat micromirrors on polysilicon surface-micromachined 2D scanners. The electrostatically actuated 2D scanner has a mirror area of 450 mum x 450 mum and an optical scan angle of +/-7.5 degrees. Compared to micromirrors made with a standard polysilicon surface-micromachining process, the radius of curvature of the micromirror has been improved by 150 times from 1.8 cm to 265 cm, with surface roughness < 10 nm. Besides, single-crystalline honeycomb micromirrors derived from silicon on insulator (SOI) have been developed to reduce the mass of the bonded mirror.

引用

页码：46 / 53

页数：8

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