Hydrocarbon lithography on graphene membranes

被引：232

作者：

Meyer, Jannik C. ^{[1
]}

Girit, C. O.

Crommie, M. F.

Zettl, A.

机构：

[1] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA

[2] Lawrence Berkeley Natl Lab, Div Sci Mat, Berkeley, CA 94720 USA

来源：

APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 12期

关键词：

D O I：

10.1063/1.2901147

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present a simple and efficient way to obtain freestanding graphene membranes. On these membranes, we demonstrate that electron-beam induced deposition of carbon can be used to obtain arbitrary patterns with a nanometer-scale resolution. In the case of a periodic grating, we obtain a half-pitch of 2.5 nm. Electron-beam induced deposition on graphene might be used to create nanometer-scale doping patterns, diffraction gratings, or etch masks in this novel electronic material. (c) 2008 American Institute of Physics.

引用

页数：3

共 32 条

[21] Detection of individual gas molecules adsorbed on graphene [J].

Schedin, F. ;

Geim, A. K. ;

Morozov, S. V. ;

Hill, E. W. ;

Blake, P. ;

Katsnelson, M. I. ;

Novoselov, K. S. .

NATURE MATERIALS, 2007, 6 (09) :652-655

[22] Formation of crystalline iron oxide nanostructures by electron beam-induced deposition at room temperature [J].

Shimojo, M. ;

Takeguchi, M. ;

Furuya, K. .

NANOTECHNOLOGY, 2006, 17 (15) :3637-3640

[23] Electron irradiation effects in single wall carbon nanotubes [J].

Smith, BW ;

Luzzi, DE .

JOURNAL OF APPLIED PHYSICS, 2001, 90 (07) :3509-3515

[24] Half-metallic graphene nanoribbons [J].

Son, Young-Woo ;

Cohen, Marvin L. ;

Louie, Steven G. .

NATURE, 2006, 444 (7117) :347-349

[25] Fabrication of magnetic nanostructures using electron beam induced chemical vapour deposition [J].

Takeguchi, M ;

Shimojo, M ;

Furuya, K .

NANOTECHNOLOGY, 2005, 16 (08) :1321-1325

[26] Sub-35 nm metal gratings fabricated using PMMA with high contrast developers [J].

Thoms, S ;

Macintyre, DS ;

McCarthy, M .

MICROELECTRONIC ENGINEERING, 1998, 42 :207-210

[27] One nanometer structure fabrication using electron beam induced deposition [J].

van Dorp, WF ;

Hagen, CW ;

Crozier, PA ;

van Someren, B ;

Kruit, P .

MICROELECTRONIC ENGINEERING, 2006, 83 (4-9) :1468-1470

[28] Approaching the resolution limit of nanometer-scale electron beam-induced deposition [J].

van Dorp, WF ;

van Someren, B ;

Hagen, CW ;

Kruit, P ;

Crozier, PA .

NANO LETTERS, 2005, 5 (07) :1303-1307

[29] Nanometer-period gratings in hydrogen silsesquioxane fabricated by electron beam lithography [J].

Word, MJ ;

Adesida, I ;

Berger, PR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06) :L12-L15

[30] Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography [J].

Yasin, S ;

Hasko, DG ;

Ahmed, H .

MICROELECTRONIC ENGINEERING, 2002, 61-2 :745-753

← 1 2 3 4 →