Hydrocarbon lithography on graphene membranes

被引:232
作者
Meyer, Jannik C. [1 ]
Girit, C. O.
Crommie, M. F.
Zettl, A.
机构
[1] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
[2] Lawrence Berkeley Natl Lab, Div Sci Mat, Berkeley, CA 94720 USA
关键词
D O I
10.1063/1.2901147
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a simple and efficient way to obtain freestanding graphene membranes. On these membranes, we demonstrate that electron-beam induced deposition of carbon can be used to obtain arbitrary patterns with a nanometer-scale resolution. In the case of a periodic grating, we obtain a half-pitch of 2.5 nm. Electron-beam induced deposition on graphene might be used to create nanometer-scale doping patterns, diffraction gratings, or etch masks in this novel electronic material. (c) 2008 American Institute of Physics.
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页数:3
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