Characterization of plumes produced during ultrashort laser ablation of metals and semiconductors

被引：1
作者：
Amoruso, S [1 ]
Vitiello, M [1 ]
机构：
[1] Univ Naples Federico II, Coherentia INFM, I-80126 Naples, Italy
来源：
13TH INTERNATIONAL SCHOOL ON QUANTUM ELECTRONICS: LASER PHYSICS AND APPLICATIONS | 2005年 / 5830卷
关键词：
femtosecond; laser ablation; plume diagnostics;
D O I：
10.1117/12.617174
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The characterization of a plasma plume is a key issue in laser ablation and deposition studies. Combined diagnostic measurements by Optical Emission Spectroscopy (OES), ion time-of-flight (TOF) and Atomic Force Microscopy (AFM) have been used to study the dynamics and composition of laser ablation plume produced during ultrashort laser irradiation of metals and semiconductors, in vacuum. Our results show that, in the laser intensity range of 10(12)-10(13) W/cm(2), the process of matter removal results in a plasma plume which is mainly composed of two different populations: atoms and nanoparticles. The nanoparticles dynamics during expansion has been analyzed through their structureless continuum optical emission, while atomic species have been identified by their characteristic emission lines. Atomic force microscopy analysis of the material deposited at room temperature has allowed the characterization of the nanoparticles size distribution. In the case of silicon, the presence of a fast ion component emitted non-thermally from the sample surface as a result of the supercritical state induced by the intense ultrashort laser pulse irradiation has been also observed.
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页码：11 / 20
页数：10
相关论文
共 32 条
[1]   Time-resolved spectroscopy measurements of a titanium plasma induced by nanosecond and femtosecond lasers [J].
Albert, O ;
Roger, S ;
Glinec, Y ;
Loulergue, JC ;
Etchepare, J ;
Boulmer-Leborgne, C ;
Perrière, J ;
Millon, E .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2003, 76 (03) :319-323
[2]   Thermal and nonthermal ion emission during high-fluence femtosecond laser ablation of metallic targets [J].
Amoruso, S ;
Wang, X ;
Altucci, C ;
de Lisio, C ;
Armenante, M ;
Bruzzese, R ;
Velotta, R .
APPLIED PHYSICS LETTERS, 2000, 77 (23) :3728-3730
[3]   Study of the plasma plume generated during near IR femtosecond laser irradiation of silicon targets [J].
Amoruso, S ;
Altucci, C ;
Bruzzese, R ;
de Lisio, C ;
Spinelli, N ;
Velotta, R ;
Vitiello, M ;
Wang, X .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2004, 79 (4-6) :1377-1380
[4]   Emission of nanoparticles during ultrashort laser irradiation of silicon targets [J].
Amoruso, S ;
Bruzzese, R ;
Spinelli, N ;
Velotta, R ;
Vitiello, M ;
Wang, X .
EUROPHYSICS LETTERS, 2004, 67 (03) :404-410
[5]   Generation of silicon nanoparticles via femtosecond laser ablation in vacuum [J].
Amoruso, S ;
Bruzzese, R ;
Spinelli, N ;
Velotta, R ;
Vitiello, M ;
Wang, X ;
Ausanio, G ;
Iannotti, V ;
Lanotte, L .
APPLIED PHYSICS LETTERS, 2004, 84 (22) :4502-4504
[6]   Double-peak distribution of electron and ion emission profile during femtosecond laser ablation of metals [J].
Amoruso, S ;
Wang, X ;
Altucci, C ;
de Lisio, C ;
Armenante, M ;
Bruzzese, R ;
Spinelli, N ;
Velotta, R .
APPLIED SURFACE SCIENCE, 2002, 186 (1-4) :358-363
[7]   Optical emission investigation of laser-produced MgB2 plume expanding in an Ar buffer gas [J].
Amoruso, S ;
Bruzzese, R ;
Spinelli, N ;
Velotta, R ;
Wang, X ;
Ferdeghini, C .
APPLIED PHYSICS LETTERS, 2002, 80 (23) :4315-4317
[8]  
AMORUSO S, IN PRESS APPL SURF S
[9]   Determination of the critical point of gold [J].
Boboridis, K ;
Pottlacher, G ;
Jäger, H .
INTERNATIONAL JOURNAL OF THERMOPHYSICS, 1999, 20 (04) :1289-1297
[10]   Femtosecond melting and ablation of semiconductors studied with time of flight mass spectroscopy [J].
Cavalleri, A ;
Sokolowski-Tinten, K ;
Bialkowski, J ;
Schreiner, M ;
von der Linde, D .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (06) :3301-3309
1234