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- [1] A simulation study of vertical Ga2O3 Schottky barrier diodes using field plate terminationJAPANESE JOURNAL OF APPLIED PHYSICS, 2024, 63 (02)Yuda, Yohei论文数: 0 引用数: 0 h-index: 0机构: Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, Japan Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, JapanEbihara, Kohei论文数: 0 引用数: 0 h-index: 0机构: Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, Japan Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, JapanNanjo, Takuma论文数: 0 引用数: 0 h-index: 0机构: Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, Japan Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, JapanFuruhashi, Masayuki论文数: 0 引用数: 0 h-index: 0机构: Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, Japan Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, JapanWatahiki, Tatsuro论文数: 0 引用数: 0 h-index: 0机构: Mitsubishi Electr Corp, Power Device Works, Amagasaki, Hyogo, Japan Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, JapanNishikawa, Kazuyasu论文数: 0 引用数: 0 h-index: 0机构: Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, Japan Mitsubishi Electr Corp, Adv Technol Res & Dev Ctr, 8-1-1 Tsukaguchi Honmachi, Amagasaki, Hyogo 6618661, Japan
- [2] 1.5 kV Vertical Ga2O3 Trench-MIS Schottky Barrier Diodes2018 76TH DEVICE RESEARCH CONFERENCE (DRC), 2018,Li, Wenshen论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USANomoto, Kazuki论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USAHu, Zongyang论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USATanen, Nicholas论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USASasaki, Kohei论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, Sayama, Osaka 3501328, Japan Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USAKuramata, Akito论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, Sayama, Osaka 3501328, Japan Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USAJena, Debdeep论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USAXing, Huili Grace论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA
- [3] A simulation study of field plate termination in Ga2O3 Schottky barrier diodesCHINESE PHYSICS B, 2018, 27 (12)Wang, Hui论文数: 0 引用数: 0 h-index: 0机构: Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China Southeast Univ, Sch Elect Sci & Engn, Nanjing 210096, Jiangsu, Peoples R China Shenzhen Key Lab Third Generat Semicond, Shenzhen 518055, Peoples R China Guangdong GaN Devices Engn & Tech Res Ctr, Shenzhen 518055, Peoples R China Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R ChinaJiang, Ling-Li论文数: 0 引用数: 0 h-index: 0机构: Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China Shenzhen Key Lab Third Generat Semicond, Shenzhen 518055, Peoples R China Guangdong GaN Devices Engn & Tech Res Ctr, Shenzhen 518055, Peoples R China Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R ChinaLin, Xin-Peng论文数: 0 引用数: 0 h-index: 0机构: Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China Shenzhen Key Lab Third Generat Semicond, Shenzhen 518055, Peoples R China Guangdong GaN Devices Engn & Tech Res Ctr, Shenzhen 518055, Peoples R China Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R ChinaLei, Si-Qi论文数: 0 引用数: 0 h-index: 0机构: Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China Shenzhen Key Lab Third Generat Semicond, Shenzhen 518055, Peoples R China Guangdong GaN Devices Engn & Tech Res Ctr, Shenzhen 518055, Peoples R China Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R ChinaYu, Hong-Yu论文数: 0 引用数: 0 h-index: 0机构: Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China Shenzhen Key Lab Third Generat Semicond, Shenzhen 518055, Peoples R China Guangdong GaN Devices Engn & Tech Res Ctr, Shenzhen 518055, Peoples R China Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China
- [4] A simulation study of field plate termination in Ga2O3 Schottky barrier diodesChinese Physics B, 2018, 27 (12) : 459 - 464论文数: 引用数: h-index:机构:蒋苓利论文数: 0 引用数: 0 h-index: 0机构: Department of Electrical and Electronic Engineering Southern University of Science and Technology Shenzhen Key Laboratory of The Third Generation Semiconductor Guangdong GaN Devices Engineering and Technical Research Center Department of Electrical and Electronic Engineering Southern University of Science and Technology林新鹏论文数: 0 引用数: 0 h-index: 0机构: Department of Electrical and Electronic Engineering Southern University of Science and Technology Shenzhen Key Laboratory of The Third Generation Semiconductor Guangdong GaN Devices Engineering and Technical Research Center Department of Electrical and Electronic Engineering Southern University of Science and Technology雷思琦论文数: 0 引用数: 0 h-index: 0机构: Department of Electrical and Electronic Engineering Southern University of Science and Technology Shenzhen Key Laboratory of The Third Generation Semiconductor Guangdong GaN Devices Engineering and Technical Research Center Department of Electrical and Electronic Engineering Southern University of Science and Technology论文数: 引用数: h-index:机构:
- [5] Fast Recovery Performance of β-Ga2O3 Trench MOS Schottky Barrier Diodes2018 76TH DEVICE RESEARCH CONFERENCE (DRC), 2018,Takatsuka, Akio论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanSasaki, Kohei论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Tamura Corp, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanWakimoto, Daiki论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Tamura Corp, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanQuang Tu Thieu论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanKoishikawa, Yuki论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Tamura Corp, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanArima, Jun论文数: 0 引用数: 0 h-index: 0机构: TDK Corp, 2-15-7 Higashi Ohwada, Ichikawa, Chiba 2728558, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanHirabayashi, Jun论文数: 0 引用数: 0 h-index: 0机构: TDK Corp, 2-15-7 Higashi Ohwada, Ichikawa, Chiba 2728558, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanInokuchi, Daisuke论文数: 0 引用数: 0 h-index: 0机构: TDK Corp, 2-15-7 Higashi Ohwada, Ichikawa, Chiba 2728558, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanFukumitsu, Yoshiaki论文数: 0 引用数: 0 h-index: 0机构: TDK Corp, 2-15-7 Higashi Ohwada, Ichikawa, Chiba 2728558, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanKuramata, Akito论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Tamura Corp, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, JapanYamakoshi, Shigenobu论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Tamura Corp, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan Novel Crystal Technol Inc, 2-3-1 Hirosedai, Sayama, Saitama 3501328, Japan
- [6] Demonstration of Ga2O3 Trench MOS-Type Schottky Barrier Diodes2017 75TH ANNUAL DEVICE RESEARCH CONFERENCE (DRC), 2017,Sasaki, K.论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol, Sayama, Saitama 3501328, Japan Tamura Corp, Sayama, Saitama 3501328, Japan Novel Crystal Technol, Sayama, Saitama 3501328, JapanWakimoto, D.论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol, Sayama, Saitama 3501328, Japan Tamura Corp, Sayama, Saitama 3501328, Japan Novel Crystal Technol, Sayama, Saitama 3501328, JapanThieu, Q. T.论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol, Sayama, Saitama 3501328, Japan Novel Crystal Technol, Sayama, Saitama 3501328, JapanKoishikawa, Y.论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol, Sayama, Saitama 3501328, Japan Tamura Corp, Sayama, Saitama 3501328, Japan Novel Crystal Technol, Sayama, Saitama 3501328, JapanKuramata, A.论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol, Sayama, Saitama 3501328, Japan Tamura Corp, Sayama, Saitama 3501328, Japan Novel Crystal Technol, Sayama, Saitama 3501328, JapanHigashiwaki, M.论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Informat & Commun Technol, Koganei, Tokyo 1848795, Japan Novel Crystal Technol, Sayama, Saitama 3501328, JapanYamakoshi, S.论文数: 0 引用数: 0 h-index: 0机构: Novel Crystal Technol, Sayama, Saitama 3501328, Japan Tamura Corp, Sayama, Saitama 3501328, Japan Novel Crystal Technol, Sayama, Saitama 3501328, Japan
- [7] Vertical Schottky Barrier Diodes of α-Ga2O3 Fabricated by Mist Epitaxy2015 73RD ANNUAL DEVICE RESEARCH CONFERENCE (DRC), 2015, : 137 - 138Oda, Masaya论文数: 0 引用数: 0 h-index: 0机构: FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, Japan Kyoto Univ, Photon & Elect Sci & Engn Ctr, Nishikyo Ku, Kyoto 6158520, Japan FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, JapanKikawa, Junjiroh论文数: 0 引用数: 0 h-index: 0机构: Ritsumeikan Univ, Res Org Sci & Engn, Kusatsu, Shiga 5258577, Japan FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, JapanTakatsuka, Akio论文数: 0 引用数: 0 h-index: 0机构: FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, Japan FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, JapanTokuda, Rie论文数: 0 引用数: 0 h-index: 0机构: FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, Japan FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, JapanSasaki, Takahiro论文数: 0 引用数: 0 h-index: 0机构: FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, Japan FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, JapanKaneko, Kentaro论文数: 0 引用数: 0 h-index: 0机构: FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, Japan Kyoto Univ, Photon & Elect Sci & Engn Ctr, Nishikyo Ku, Kyoto 6158520, Japan FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, JapanFujita, Shizuo论文数: 0 引用数: 0 h-index: 0机构: Kyoto Univ, Photon & Elect Sci & Engn Ctr, Nishikyo Ku, Kyoto 6158520, Japan FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, JapanHitora, Toshimi论文数: 0 引用数: 0 h-index: 0机构: FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, Japan FLOSFIA INC, Nishikyo Ku, Kyodai Katsura Venture Plaza, Kyoto 6158245, Japan
- [8] Vertical β-Ga2O3 Schottky Barrier Diodes With Field Plate Assisted Negative Beveled Termination and Positive Beveled TerminationIEEE ELECTRON DEVICE LETTERS, 2023, 44 (01) : 21 - 24Chen, Hu论文数: 0 引用数: 0 h-index: 0机构: Zhejiang Univ, Coll Elect Engn, Hangzhou 310027, Peoples R China Zhejiang Univ, Coll Elect Engn, Hangzhou 310027, Peoples R ChinaWang, Hengyu论文数: 0 引用数: 0 h-index: 0机构: Zhejiang Univ, Coll Elect Engn, Hangzhou 310027, Peoples R China Zhejiang Univ, Coll Elect Engn, Hangzhou 310027, Peoples R ChinaSheng, Kuang论文数: 0 引用数: 0 h-index: 0机构: Zhejiang Univ, Coll Elect Engn, Hangzhou 310027, Peoples R China Zhejiang Univ, Coll Elect Engn, Hangzhou 310027, Peoples R China
- [9] Characterization of β-Ga2O3 Schottky Barrier Diodes2018 18TH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT), 2018, : 47 - 49论文数: 引用数: h-index:机构:Muneta, I论文数: 0 引用数: 0 h-index: 0机构: Tokyo Inst Technol, Sch Engn, Midori Ku, 4259 Nagatsuta, Yokohama, Kanagawa 2268502, Japan Tokyo Inst Technol, Sch Engn, Midori Ku, 4259 Nagatsuta, Yokohama, Kanagawa 2268502, Japan论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:Iwai, H.论文数: 0 引用数: 0 h-index: 0机构: Tokyo Inst Technol, Inst Innovat Res, Midori Ku, 4259 Nagatsuta, Yokohama, Kanagawa 2268052, Japan Tokyo Inst Technol, Sch Engn, Midori Ku, 4259 Nagatsuta, Yokohama, Kanagawa 2268502, Japan论文数: 引用数: h-index:机构:
- [10] Vertical Ga2O3 Schottky Barrier Diodes on Single-Crystal β-Ga2O3 (-201) Substrates2016 74TH ANNUAL DEVICE RESEARCH CONFERENCE (DRC), 2016,Song, Bo论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USAVerma, Amit Kumar论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USANomoto, Kazuki论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USAZhu, Mingda论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USAJena, Debdeep论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USAXing, Huili论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA