The (2x4) and (2x1) structures of the clean GaP(001) surface

被引:23
作者
Sanada, N
Mochizuki, S
Ichikawa, S
Utsumi, N
Shimomura, M
Kaneda, G
Takeuchi, A
Suzuki, Y
Fukuda, Y [1 ]
Tanaka, S
Kamata, M
机构
[1] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 4328011, Japan
[2] Inst Mol Sci, Okazaki, Aichi 4448585, Japan
关键词
gallium phosphide; low index single crystal surfaces; photoelectron diffraction; scanning tunneling microscopy; semiconductor surfaces; synchrotron radiation photoelectron spectroscopy;
D O I
10.1016/S0039-6028(98)00769-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The surface structure of GaP(001) has been studied using X-ray photoelectron diffraction (XPD), low-energy electron diffraction ( LEED), synchrotron radiation photoemission spectroscopy (SRPES), Auger electron spectroscopy (AES) and scanning tunneling microscopy (STM). It is confirmed that the clean GaP(001) surface prepared by Ar-ion sputtering and annealing (ISA) exhibits a (2 x 4) reconstruction terminated by gallium. STM images indicate that about 20% of the gallium dimers at the surface are not regularly arranged in the [<1(1)over bar>0] direction. The surface core-level shifts of Ga 3d and P 2p for the (2 x 4) surface, as measured by SRPES, suggest that the surface components S1 and S2 correspond to Ga dimers at the surface and Ga atoms with three-fold coordination in the surface region. respectively. The component S3 is also suggested to be due to P atoms with three-fold coordination. Upon adsorption of t-butylphosphine on the (2 x 4) surface at 350 degrees C, a (2 x 1) structure is observed by LEED and STM. Based on the above results, models of the GaP(001)-(2 x 4) and -(2 x 1) surface structures are proposed. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:120 / 127
页数:8
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