Magnetic modifications of thin CoFe films induced by Xe+-ion irradiation

被引:17
作者
Gupta, R
Müller, GA
Schaaf, P
Zhang, K
Lieb, KP
机构
[1] Univ Gottingen, Inst Phys 2, D-37073 Gottingen, Germany
[2] Univ Gottingen, SFB 602, D-37073 Gottingen, Germany
关键词
ion implantation; magnetic anisotropy; thin film; permendur; magneto-optical kerr effect;
D O I
10.1016/j.nimb.2003.11.060
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We have investigated magnetic field assisted implantations of 200 keV Xe-ions in 30-90 nm thick Fe50Co50 alloy films on Si substrates at ion fluences of up to 1.3 x 10(16) cm(-2). Longitudinal magneto-optic kerr effect measurements at room temperature suggest that the coercivity of the films first decreases for increasing ion fluence, while the magnetic remanence develops as a superposition of fourfold and twofold uniaxial anisotropies. Higher Xe-ion fluences increase the density of pinning centers therefore causing slight increases of the coercivity and of the magnetostrictive anisotropy. Lattice expansion and ion-induced grain growth were measured parallel to MOKE by X-ray diffraction. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:350 / 354
页数:5
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