Fabrication and characterization of NbN, AlN and NbN/AlN/NbN on MgO substrates

被引：13

作者：

Kang, L ^{[1
]}

Wu, PH ^{[1
]}

Sh, JR ^{[1
]}

Cai, WX ^{[1
]}

Yang, SZ ^{[1
]}

Ji, ZM ^{[1
]}

Wang, Z ^{[1
]}

机构：

[1] Nanjing Univ, RISE, Dept Elect Sci & Engn, Nanjing, Peoples R China

来源：

SUPERCONDUCTOR SCIENCE & TECHNOLOGY | 2003年 / 16卷 / 12期

关键词：

D O I：

10.1088/0953-2048/16/12/021

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

At ambient substrate temperatures, NbN and AlN thin films as well as NbN/AlN/NbN sandwiches are prepared on single crystal MgO substrates, using direct current (dc) or radio frequency (RF) magnetron sputtering techniques. Excellent single crystal orientations of these structures are revealed by x-ray diffraction and transmission electron microscopy (TEM), while x-ray photoelectron spectroscope (XPS) shows that the stoichiometric composition of the NbN films is 1: 0.9 (Nb:N). Furthermore, AFM (atomic force microscope) scans indicate a root mean square (rms) roughness of 0.755 nm for AlN/NbN, and 0.83 nm for AlN, both over an area of 5 mum x 5 mum.

引用

页码：1417 / 1421

页数：5

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