Auger recombination in InN thin films

被引:26
|
作者
Jang, D. -J. [1 ,2 ]
Lin, G. -T. [1 ,2 ]
Hsiao, C. -L. [1 ,2 ]
Tu, L. W. [1 ,2 ]
Lee, M. -E. [3 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[2] Natl Sun Yat Sen Univ, Ctr Neurosci & Nanotechnol, Kaohsiung 80424, Taiwan
[3] Natl Kaohsiung Normal Univ, Dept Phys, Kaohsiung 80264, Taiwan
关键词
D O I
10.1063/1.2837537
中图分类号
O59 [应用物理学];
学科分类号
摘要
Auger recombination is studied in InN thin films using an ultrafast time-resolved photoluminescence apparatus. The decay rates are analyzed with nonlinear dependence of the photoluminescence intensity on the carrier concentration. The fitted radiative recombination coefficients at a temperature of 35 K are consistent with the theoretical prediction. The Auger rates are small at low carrier concentrations but increase quadratically with the carrier concentration. The Auger activation energies of 4.3 and 9.0 meV obtained from the temperature-dependent Auger coefficient indicate that Auger recombination is weakly dependent on temperature and is a phonon-assisted process. (c) 2008 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 50 条
  • [1] Auger recombination as the dominant nonradiative recombination channel in InN
    Cho, YongJin
    Lue, Xiang
    Wienold, Martin
    Ramsteiner, Manfred
    Grahn, Holger T.
    Brandt, Oliver
    PHYSICAL REVIEW B, 2013, 87 (15)
  • [2] Carrier recombination dynamics in Si doped InN thin films
    Mohanta, Antaryami
    Jang, D-J
    Lin, G-T
    Lin, Y-T
    Tu, L. W.
    JOURNAL OF APPLIED PHYSICS, 2011, 110 (02)
  • [3] Direct Auger recombination and density-dependent hole diffusion in InN
    Aleksiejunas, Ramunas
    Podlipskas, Zydrunas
    Nargelas, Saulius
    Kadys, Arunas
    Kolenda, Marek
    Nomeika, Kazimieras
    Mickevicius, Juras
    Tamulaitis, Gintautas
    SCIENTIFIC REPORTS, 2018, 8
  • [4] Direct Auger recombination and density-dependent hole diffusion in InN
    Ramūnas Aleksiejūnas
    Žydrūnas Podlipskas
    Saulius Nargelas
    Arūnas Kadys
    Marek Kolenda
    Kazimieras Nomeika
    Jūras Mickevičius
    Gintautas Tamulaitis
    Scientific Reports, 8
  • [5] Energy relaxation of InN thin films
    Jang, D.-J.
    Lin, G.-T.
    Wu, C.-L.
    Hsiao, C.-L.
    Tu, L. W.
    Lee, M.-E.
    APPLIED PHYSICS LETTERS, 2007, 91 (09)
  • [6] Nanoindentation responses of InN thin films
    Jian, S.-R. (srjian@gmail.com), 1600, Elsevier Ltd (609):
  • [7] Electrochromic reaction of InN thin films
    Asai, N
    Inoue, Y
    Sugimura, H
    Takai, O
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (06) : 2365 - 2369
  • [8] Nanoindentation responses of InN thin films
    Jian, Sheng-Rui
    Huang, Chih-Yen
    Ke, Wen-Cheng
    JOURNAL OF ALLOYS AND COMPOUNDS, 2014, 609 : 125 - 128
  • [9] Optical properties of InN thin films
    Malakhov, VY
    LIGHT-EMITTING DIODES: RESEARCH, MANUFACTURING, AND APPLICATIONS IV, 2000, 3938 : 131 - 136
  • [10] Bandtail characteristics in InN thin films
    Shen, WZ
    Jiang, LF
    Yang, HF
    Meng, FY
    Ogawa, H
    Guo, QX
    APPLIED PHYSICS LETTERS, 2002, 80 (12) : 2063 - 2065