Experimental evidence of ballistic transport in cylindrical gate-all-around twin silicon nanowire metal-oxide-semiconductor field-effect transistors

被引:69
作者
Cho, K. H. [1 ]
Yeo, K. H. [1 ]
Yeoh, Y. Y. [1 ]
Suk, S. D. [1 ]
Li, M. [1 ]
Lee, J. M. [1 ]
Kim, M. -S. [1 ]
Kim, D. -W. [1 ]
Park, D. [1 ]
Hong, B. H. [2 ,3 ]
Jung, Y. C. [2 ,3 ]
Hwang, S. W. [2 ,3 ]
机构
[1] Samsung Elect Co, R&D Ctr, Adv Technol Dev Team 1, Yongin 446711, Gyeonggi Do, South Korea
[2] Korea Univ, Res Ctr Time Domain Nanofunct Devices, Seoul 136701, South Korea
[3] Korea Univ, Sch Elect Engn, Seoul 136701, South Korea
关键词
D O I
10.1063/1.2840187
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the electrical characteristics of cylindrical gate-all-around twin silicon nanowire metal-oxide-semiconductor field effect-transistors with 4 nm radius and the gate length ranging from 22 to 408 nm. We observed strong transconductance overshoot in the linear source-drain bias regime in the devices with channel length shorter than 46 nm. The mean free path estimated from the slope of the zero-field one dimensional ballistic resistance measured as a function of device length was almost the same as this length. (c) 2008 American Institute of Physics.
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页数:3
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