Electron-beam-induced current study of grain boundaries in multicrystalline Si

被引:15
|
作者
Chen, Jun [1 ]
Sekiguchi, Takashi [1 ]
Yang, Deren [2 ]
机构
[1] Natl Inst Mat Sci, Adv Elect Mat Ctr, Tsukuba, Ibaraki 3050044, Japan
[2] Nanjing Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China
关键词
D O I
10.1002/pssc.200675435
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Systematical studies on the intrinsic and extrinsic recombination activities of grain boundaries (GBs) in multicrystalline silicon (mc-Si) were reported by using temperature-dependent electron-beam-induced current (EBIC). EBIC results revealed that in the clean mc-Si, all the GBs exhibited weak EBIC contrasts at 300 K, suggesting their recombination strengths were weak and the energy levels were associated with shallow levels. The effect of impurity contamination was also evaluated by employing different contamination levels of Fe. The EBIC contrasts of GBs were enhanced after Fe contamination and showed a strong dependence on both the GB character and contamination level. The impurity gettering abilities of GBs were as following, SA > R > high-Sigma > low-Sigma. SA GBs were found with the strongest impurity gettering ability and tended to be the most detrimental GBs. Finally, the effect of H-passivation on different GBs with or without contamination was evaluated.
引用
收藏
页码:2908 / +
页数:3
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