Heater system optimization for robust ePCM reliability and scalability in 28nm FDSOI technology

被引:3
|
作者
Ranica, R. [1 ]
Berthelon, R. [1 ]
Gandolfo, A. [2 ]
Samanni, G. [2 ]
Gomiero, E. [2 ]
Jasse, J. [2 ]
Mattavelli, P. [2 ]
Sandrini, J. [1 ]
Querre, M. [1 ]
Le-Friec, Y. [1 ]
Poulet, J. [1 ]
Caubet, V [1 ]
Favennec, L. [1 ]
Boccaccio, C. [1 ]
Ghezzi, G. [1 ]
Gallon, C. [1 ]
Grenier, J. C. [1 ]
Dumont, B. [1 ]
Weber, O. [1 ]
Villaret, A. [1 ]
Beneyton, R. [1 ]
Cherault, N. [1 ]
Ristoiu, D. [1 ]
Del Medico, S. [1 ]
Kermarrec, O. [1 ]
Reynard, J. P. [1 ]
Boivin, P. [3 ]
Souhaite, A. [4 ]
Desvoivres, L. [4 ]
Chouteau, S. [1 ]
Sassoulas, P. O. [1 ]
Clement, L. [1 ]
Valery, A. [1 ]
Petroni, E. [2 ]
Turgis, D. [1 ]
Lippiello, A. [1 ]
Scotti, L. [1 ]
Disegni, F. [2 ]
Ventre, A. [2 ]
Ornaghi, D. [2 ]
De Tomasi, M. [2 ]
Maurelli, A. [2 ]
Conte, A. [3 ]
Arnaud, F. [1 ]
Redaelli, A. [2 ]
Annunziata, R. [2 ]
Cappelletti, P. [2 ]
Piazza, F. [1 ]
Ferreira, P. [1 ]
Gonella, R. [1 ]
机构
[1] STMICROELECTRONICS, Crolles, France
[2] STMICROELECTRONICS, Agrate Brianza, Italy
[3] STMICROELECTRONICS, Rousset, France
[4] CEA LETI, Grenoble, France
关键词
D O I
10.1109/IEDM19574.2021.9720669
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
One of the most promising Embedded Phase Change Memory (ePCM) integration scheme is the wall architecture, which relies on the dedicated Heater element to thermally switch the device. A good control of this element is a key factor to satisfy the performance requirements of the automotive market. In this paper, the optimization of TiSiN Heater system in 0.019 mu m(2) ePCM cell realized with 28nm FDSOI technology is extensively reported. Key fabrication parameters defining heating efficiency are investigated, covering a large range of Heater resistance. Their impact on ePCM reliability of elementary device and 16MB memory array, considering both retention and endurance, is characterized and the key role played by Heater is demonstrated, opening a path to scaled programming currents. Finally, TiSiN ALD deposition process is proposed as the solution to improve uniformity and scalability of Heater resistance. As Heater is the variable controlling the whole system, this approach guarantees the robustness of ePCM technology for automotive grade-0 applications.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Energy Study for 28nm FDSOI Technology
    Kheirallah, Rida
    Azemard, Nadine
    Ducharme, Gilles
    PROCEEDINGS 2015 6TH INTERNATIONAL WORKSHOP ON CMOS VARIABILITY (VARI), 2015, : 23 - 26
  • [2] Energy Efficiency Optimization for Digital Applications in 28nm UTBB FDSOI Technology
    Amara, Amara
    Gupta, Navneet
    Shaik, Khaja Ahmad
    Anghel, Costin
    Hoh, Kiyoo
    2015 22ND INTERNATIONAL CONFERENCE MIXED DESIGN OF INTEGRATED CIRCUITS & SYSTEMS (MIXDES), 2015, : 23 - 23
  • [3] Integration of SPAD in 28nm FDSOI CMOS technology
    de Albuquerque, T. Chaves
    Calmon, F.
    Clerc, R.
    Pittet, P.
    Benhammou, Y.
    Golanski, D.
    Jouan, S.
    Rideau, D.
    Cathelin, A.
    2018 48TH EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE (ESSDERC), 2018, : 82 - 85
  • [4] Conductivity and reliability of 28nm FDSOI Middle of the line dielectrics
    Federspiel, X.
    Nouguier, D.
    Ney, D.
    Ya, T.
    2017 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS), 2017,
  • [5] 28nm node bulk vs FDSOI reliability comparison
    Federspiel, X.
    Angot, D.
    Rafik, M.
    Cacho, F.
    Bajolet, A.
    Planes, N.
    Roy, D.
    Haond, M.
    Arnaud, F.
    2012 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS), 2012,
  • [6] Reliability of 8Mbit Embedded-STT-MRAM in 28nm FDSOI Technology
    Ji, Y.
    Goo, H. J.
    Lim, J.
    Lee, S. B.
    Lee, S.
    Uemura, T.
    Park, J. C.
    Han, S. I.
    Shin, S. C.
    Lee, J. H.
    Song, Y. J.
    Lee, K. M.
    Shin, H. M.
    Hwang, S. H.
    Seo, B. Y.
    Lee, Y. K.
    Kim, J. C.
    Koh, G. H.
    Park, K. C.
    Pae, S.
    Jeong, G. T.
    Yoon, J. S.
    Jung, E. S.
    2019 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS), 2019,
  • [7] 28nm FDSOI Offer for Academia and Industry
    IEEE INTERNATIONAL SOI CONFERENCE, 2012,
  • [8] Parameter Extraction for a Simplified EKV-model in a 28nm FDSOI Technology
    Bajer, Konstantin
    Paul, Steffen
    Peters-Drolshagen, Dagmar
    PROCEEDINGS OF 2020 27TH INTERNATIONAL CONFERENCE ON MIXED DESIGN OF INTEGRATED CIRCUITS AND SYSTEM (MIXDES), 2020, : 45 - 49
  • [9] Design of ULV ULP LNAs Exploiting FBB in FDSOI 28nm Technology
    Aragones, Xavier
    Alvarez, Alex
    Pablo Rovayo, Juan
    Altet, Josep
    Mateo, Diego
    2019 XXXIV CONFERENCE ON DESIGN OF CIRCUITS AND INTEGRATED SYSTEMS (DCIS), 2019,
  • [10] An Ultrafast Active Quenching Circuit for SPAD in CMOS 28nm FDSOI Technology
    Lakeh, Mohammadreza Dolatpoor
    Kammerer, Jean-Baptiste
    Uhring, Wilfried
    Schell, Jean-Baptiste
    Calmon, Francis
    2020 IEEE SENSORS, 2020,