Paving the way toward the world's first 200mm SiC pilot line

被引:25
|
作者
Musolino, Mattia [3 ]
Xu, Xueping [1 ]
Wang, Hui [1 ]
Rengarajan, Varathajan [1 ]
Zwieback, Ilya [1 ]
Ruland, Gary [1 ]
Crippa, Danilo [2 ]
Mauceri, Marco [2 ]
Calabretta, Michele [3 ]
Messina, Angelo [3 ,4 ]
机构
[1] II VI Inc, 375 Saxonburg Blvd, Saxonburg, PA 16056 USA
[2] LPE Spa, Via Falzarego 8, I-20021 Baranzate Di Bollate, MI, Italy
[3] STMicroelectronics, Str Primosole 50, I-95121 Catania, Italy
[4] CNR, Ist Microelettron & Microsistemi, Str 8,5, I-95121 Catania, Italy
关键词
4H SiC; 200 mm wafers; 8-Inch silicon carbide; REACTION; Pilot line; Epitaxial growth;
D O I
10.1016/j.mssp.2021.106088
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In recent years, the power electronics industry based on silicon carbide (SiC) has rapidly expanded, but suppliers are struggling to meet the market demand both for final devices and for the starting raw material, which nowadays consists of SiC wafers with a diameter of 150 mm (6 inches). For this reason, the top industrial players in the field of SiC power electronics are starting the development of next-generation wafers with a diameter of 200 mm (8 inches). This work describes the recent achievements in the implementation of the world's first industrial pilot line to produce power devices based on 200 mm SiC wafers. In particular, the crystal growth of the 200 mm SiC boules, the slicing and polishing of the wafers, the deposition of the epitaxial layer, and the first tests in the pilot lines are presented.
引用
收藏
页数:5
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