Paving the way toward the world's first 200mm SiC pilot line

被引:25
|
作者
Musolino, Mattia [3 ]
Xu, Xueping [1 ]
Wang, Hui [1 ]
Rengarajan, Varathajan [1 ]
Zwieback, Ilya [1 ]
Ruland, Gary [1 ]
Crippa, Danilo [2 ]
Mauceri, Marco [2 ]
Calabretta, Michele [3 ]
Messina, Angelo [3 ,4 ]
机构
[1] II VI Inc, 375 Saxonburg Blvd, Saxonburg, PA 16056 USA
[2] LPE Spa, Via Falzarego 8, I-20021 Baranzate Di Bollate, MI, Italy
[3] STMicroelectronics, Str Primosole 50, I-95121 Catania, Italy
[4] CNR, Ist Microelettron & Microsistemi, Str 8,5, I-95121 Catania, Italy
关键词
4H SiC; 200 mm wafers; 8-Inch silicon carbide; REACTION; Pilot line; Epitaxial growth;
D O I
10.1016/j.mssp.2021.106088
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In recent years, the power electronics industry based on silicon carbide (SiC) has rapidly expanded, but suppliers are struggling to meet the market demand both for final devices and for the starting raw material, which nowadays consists of SiC wafers with a diameter of 150 mm (6 inches). For this reason, the top industrial players in the field of SiC power electronics are starting the development of next-generation wafers with a diameter of 200 mm (8 inches). This work describes the recent achievements in the implementation of the world's first industrial pilot line to produce power devices based on 200 mm SiC wafers. In particular, the crystal growth of the 200 mm SiC boules, the slicing and polishing of the wafers, the deposition of the epitaxial layer, and the first tests in the pilot lines are presented.
引用
收藏
页数:5
相关论文
共 50 条
  • [1] IR to bring 200mm on-line in Wales
    不详
    INFORMACIJE MIDEM-JOURNAL OF MICROELECTRONICS ELECTRONIC COMPONENTS AND MATERIALS, 2004, 34 (02): : 126 - 126
  • [2] 接近速度200mm/s的高速弯板机
    陈循介
    世界制造技术与装备市场, 2002, (02) : 64 - 64
  • [3] Buffer Layer Dependence of Defectivity in 200mm 4H-SiC Homoepitaxy
    Raciti, Domenica
    Anzalone, Ruggero
    Isacson, Mathias
    Piluso, Nicolò
    Severino, Andrea
    Defect and Diffusion Forum, 2024, 434 : 117 - 121
  • [4] Singapore's First 200mm SiC Open Ecosystem Platform: Addressing Economics, Performances & Reliability of High-Power Devices, and Evolution into RF/mmWave Solutions
    Chand, Umesh
    2023 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI-TSA/VLSI-DAT, 2023,
  • [5] Epitaxial Defectivity Characterization Combining Surface Voltage and Photoluminescence Mapping on 200mm 4H-SiC Wafers
    Thörnberg, Jimmy
    Polisski, Gennadi
    Carria, Egidio
    Isacson, Mathias
    Magnusson, Björn
    Defect and Diffusion Forum, 2024, 434 : 111 - 115
  • [6] Implementation of a fluctuation smoothing production control policy in IBM's 200mm wafer fab
    Morrison, James R.
    Campbell, Brian
    Dews, Elizabeth
    LaFreniere, John
    2005 44th IEEE Conference on Decision and Control & European Control Conference, Vols 1-8, 2005, : 7732 - 7737
  • [7] Innovative Asphalt Pavement Technology: Paving the Way for the World's Roadways
    Epps, Jon A.
    TRANSPORTATION RESEARCH RECORD, 2019, 2673 (01) : 1 - 16
  • [8] Holistic cycle time analysis and improvement project within a 200mm lithography I-line production area
    Zarbock, Thomas
    Lehmann, Frank
    Fellendorf, Jens
    2006 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, 2006, : 126 - +
  • [9] 黑色大炮 尼康AF-S 200mm f/2G ED VR Ⅱ
    岸上的鱼
    邢亚辉
    人像摄影, 2011, (02) : 202 - 205
  • [10] 10Gbit/s dispersion managed soliton propagation over 200Mm without active control
    Harper, P
    Penketh, IS
    Alleston, SB
    Bennion, I
    Doran, NJ
    ELECTRONICS LETTERS, 1998, 34 (21) : 1997 - 1999