Facile fabrication of flexible graphene FETs by sunlight reduction of graphene oxide

被引:5
|
作者
Ma, Jia-Nan [1 ]
He, Yan [1 ]
Liu, Yan [2 ]
Han, Dong-Dong [1 ]
Liu, Yu-Qing [1 ]
Mao, Jiang-Wei [1 ]
Jiang, Hao-Bo [2 ]
Zhang, Yong-Lai [1 ]
机构
[1] Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, 2699 Qianjin St, Changchun 130012, Jilin, Peoples R China
[2] Jilin Univ, Key Lab Bion Engn, Minist Educ, Changchun 130022, Jilin, Peoples R China
基金
中国国家自然科学基金;
关键词
FIELD-EFFECT TRANSISTORS; QUANTUM DOTS; DEVICES; FILMS;
D O I
10.1364/OL.42.003403
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We reported here a facile fabrication of flexible graphene-based field effect transistors (FETs) by sunlight reduction of graphene oxide (GO) as channel material. As a mask-free and chemical-free method, sunlight photoreduction of GO without the use of any complex equipments is simple and green. The resultant FET demonstrated excellent electrical properties (e.g., an optimized I on/I off ratio of 111, hole mobility of 0.17 cm(2) V-1 s(-1)), revealing great potential for development of flexible microelectrics. Additionally, since the reduced GO channel could be fabricated by sunlight treatment between two pre-patterned electrodes, the process features post-fabrication capability, which makes it possible to integrate graphene-based devices with given device structures. (C) 2017 Optical Society of America
引用
收藏
页码:3403 / 3406
页数:4
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