Molecular Series-Tunneling Junctions

被引:31
作者
Liao, Kung-Ching [1 ]
Hsu, Liang-Yan [2 ]
Bowers, Carleen M. [1 ]
Rabitz, Herschel [2 ]
Whitesides, George M. [1 ,3 ,4 ]
机构
[1] Harvard Univ, Dept Chem & Chem Biol, Cambridge, MA 02138 USA
[2] Princeton Univ, Dept Chem, Princeton, NJ 08544 USA
[3] Harvard Univ, Wyss Inst Biol Inspired Engn, Cambridge, MA 02138 USA
[4] Harvard Univ, Kavli Inst Bionano Sci & Technol, Cambridge, MA 02138 USA
基金
美国国家科学基金会;
关键词
SELF-ASSEMBLED MONOLAYERS; ELECTRON-TRANSPORT; CHARGE-TRANSPORT; QUANTUM INTERFERENCE; CONTACT AREA; METAL; CONDUCTANCE; TRANSITION; INTERFACE; INJECTION;
D O I
10.1021/jacs.5b00448
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Charge transport through junctions consisting of insulating Molecular units is a quantum phenomenon that cannot be described adequately by classical circuit laws. This paper explores tunneling current densities in self assembled monolayer (SAM) based junctions with the structure Ag-TS/O2C-R-1-R-2-H//Ga2O3/EGaIn, where Ag-TS is template-stripped silver and EGaIn is the eutectic-alloy of gallium and indium; R-1 and R-2 refer to two classes of insulating molecular units-(CH2)(n) and (C6H4)(m)-that are connected in series and have different tunneling decay constants in the Simmons equation. These junctions can be analyzed as a form of series-tunneling junctions based on the observation that permuting the order of R-1 and R-2 in the junction does not alter the overall rate of charge transport. By using the Ag/O2C interface, this system decouples the highest occupied molecular orbital (HOMO, which is localized on the carboxylate group) from strong interactions with the R-1 and R-2 units. The differences in rates of tunneling are this,determined by the,electronic structure of the groups R-1 and R-2; these differences are not influenced by the order of R-1 and R-2 in the SAM. In an electrical potential model that rationalizes this observation, R-1 and R-2 contribute independently to the height of the barrier, this model explicitly assumes that contributions to rates of tunneling from the Ag-TS/O2C and H//Ga2O3 interfaces are constant across the series examined. The current density of these series-tunneling junctions can be described by J(V) = J(0)(V) exp(-beta(1)d(1) - beta(2)d(2)), where J(V) is the current density (A/cm(2)) at applied Voltage V and beta(i) and d(i) are the parameters describing the attenuation of the tunneling current through a rectangular tunneling barrier, with width d and a height related to the attenuation factor beta.
引用
收藏
页码:5948 / 5954
页数:7
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