Micromechanical mixer-filters ("Mixlers")

被引:123
作者
Wong, AC
Nguyen, CTC [1 ]
机构
[1] Globespanvirata, Irvine, CA USA
[2] DARPA MTO, Arlington, VA 22203 USA
关键词
bandpass filter; electromechanical coupling; IF; intermediate frequency; microelectromechanical systems (MENIS); microelectromechanical devices; mixer; quality factor; resonator; VHF;
D O I
10.1109/JMEMS.2003.823218
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A device comprised of interlinked micromechanical resonators with capacitive mixer transducers has been demonstrated to perform both frequency translation (i.e., mixing) and highly selective low-loss filtering of applied electrical input signals. In particular, successful downconversion of a 200-MHz radio frequency (RF) signal down to a 37-MHz intermediate frequency (IF) and subsequent high-Q bandpass filtering at the IF are demonstrated using this single, passive, micromechanical device, all with less than 13 dB of combined mixing conversion and filter insertion loss. The mixer-filter (or "mixler") RF-to-IF voltage transfer function is shown to depend upon a ratio of local oscillator amplitude and applied bias voltages.
引用
收藏
页码:100 / 112
页数:13
相关论文
共 27 条
[1]   Micromachined thermally based CMOS microsensors [J].
Baltes, H ;
Paul, O ;
Brand, O .
PROCEEDINGS OF THE IEEE, 1998, 86 (08) :1660-1678
[2]   High-Q HF microelectromechanical filters [J].
Bannon, FD ;
Clark, JR ;
Nguyen, CTC .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2000, 35 (04) :512-526
[3]  
BUSTILLO JM, 1994, MICROSYST TECHNOL, V1, P30
[4]  
CORE TA, 1993, SOLID STATE TECHNOL, V36, P39
[5]   Laminated high-aspect-ratio microstructures in a conventional CMOS process [J].
Fedder, GK ;
Santhanam, S ;
Reed, ML ;
Eagle, SC ;
Guillou, DF ;
Lu, MSC ;
Carley, LR .
SENSORS AND ACTUATORS A-PHYSICAL, 1996, 57 (02) :103-110
[6]  
Flugge W., 1962, HDB ENG MECH
[7]   Post-CMOS integration of germanium microstructures [J].
Franke, AE ;
Bilic, D ;
Chang, DT ;
Jones, PT ;
King, TJ ;
Howe, RT ;
Johnson, GC .
MEMS '99: TWELFTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 1999, :630-637
[8]  
HSU WT, 1999, 10 INT C SOL STAT SE, P932
[9]   PRINCIPLES OF WET CHEMICAL-PROCESSING IN ULSI MICROFABRICATION [J].
KIKYUAMA, H ;
MIKI, N ;
SAKA, K ;
TAKANO, J ;
KAWANABE, I ;
MIYASHITA, M ;
OHMI, T .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1991, 4 (01) :26-35
[10]   HYDROFLUORIC-ACID ETCHING OF SILICON DIOXIDE SACRIFICIAL LAYERS .1. EXPERIMENTAL-OBSERVATIONS [J].
MONK, DJ ;
SOANE, DS ;
HOWE, RT .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (01) :264-269