Temperature Dependent Current Transport Mechanism in Graphene/Germanium Schottky Barrier Diode

被引:16
作者
Khurelbaatar, Zagarzusem [1 ]
Kil, Yeon-Ho [1 ]
Shim, Kyu-Hwan [1 ]
Cho, Hyunjin [2 ]
Kim, Myung-Jong [2 ]
Kim, Yong-Tae [3 ]
Choi, Chel-Jong [1 ]
机构
[1] Chonbuk Natl Univ, Semicond Phys Res Ctr, Sch Semicond & Chem Engn, Jeonju 561756, South Korea
[2] Korea Inst Sci & Technol, Inst Adv Composite Mat, Soft Innovat Mat Res Ctr, Wonju 565905, South Korea
[3] Korea Inst Sci & Technol, Semicond Mat & Device Lab, Seoul 130650, South Korea
基金
新加坡国家研究基金会;
关键词
Graphene; Ge; Si; Schottky barrier height; ideality factor; Schottky barrier inhomogeneities; Gaussian distribution; GE-ON-SI; JUNCTION; VOLTAGE; HEIGHT;
D O I
10.5573/JSTS.2015.15.1.007
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated electrical properties of graphene/Ge Schottky barrier diode (SBD) fabricated on Ge film epitaxially grown on Si substrate. When decreasing temperature, barrier height decreased and ideality factor increased, implying their strong temperature dependency. From the conventional Richardson plot, Richardson constant was much less than the theoretical value for n-type Ge. Assuming Gaussian distribution of Schottky barrier height with mean Schottky barrier height and standard deviation, Richardson constant extracted from the modified Richardson plot was comparable to the theoretical value for n-type Ge. Thus, the abnormal temperature dependent Schottky behavior of graphene/Ge SBD could be associated with a considerable deviation from the ideal thermionic emission caused by Schottky barrier inhomogeneities.
引用
收藏
页码:7 / 15
页数:9
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