Femtosecond laser pulse induced breakdown in dielectric thin films

被引：148
作者：
Jasapara, J [1 ]
Nampoothiri, AVV
Rudolph, W
Ristau, D
Starke, K
机构：
[1] Univ New Mexico, Dept Phys & Astron, Albuquerque, NM 87131 USA
[2] Laser Zentrum Hannover eV, D-30419 Hannover, Germany
来源：
PHYSICAL REVIEW B | 2001年 / 63卷 / 04期
关键词：
D O I：
10.1103/PhysRevB.63.045117
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Laser-induced breakdown of a high-quality mirror consisting of alternating lambda /4 layers of Ta2O5 and SiO2 and a single 500-nm thin film of Ta2O5 were studied with amplified and unamplified femtosecond pulses. Thr experimental data can be fitted with a model taking into account multiphoton absorption. impact ionization. and local intensity enhancements due to interference effects in the films. Incubation effects are observed when the coatings are damaged with multiple pulses from a femtosecond oscillator. The results indicate that state of the art, high-quality thin films show a damage behavior that is similar to bulk materials. Defects and impurities play a negligible role.
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页数：5
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