EBIC study of field effect transistors on modulation-doped AlGaAs/InGaAs/GaAs heterostructures

被引:0
|
作者
Sieber, B [1 ]
Farvacque, JL [1 ]
机构
[1] Univ Sci & Technol Lille, URA 234, Lab Struct & Proprietes Etat Solide, FR-59655 Villeneuve Dascq, France
关键词
D O I
10.4028/www.scientific.net/SSP.63-64.13
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The EBIC signal from Field Effect Transistors on a AlGaAs/InGaAs/GaAs modulation-doped heterostructure has been measured at 87 K. The experiments were made in the gate-source configuration. It is found that the EBIC signal can be limited by the quantum well channel current of majority carriers. The analysis of the EBIC current as a function of beam voltage and applied bias, combined with that of the cathodoluminescence intensity, allows to conclude that the recombination at the InGaAs quantum well is dominated by interface recombination.
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页码:13 / 24
页数:12
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