Surface dependent behaviour of CdS LO-phonon mode

被引:4
作者
Molina-Contreras, J. R.
Medina-Gutierrez, C.
Frausto-Reyes, C.
Trejo-Vazquez, R.
Villalobos-Pina, F. J.
Romo-Luevano, G.
Calixto, S.
机构
[1] Inst Tecnol Aguascalientes, Dept Ingn Elect & Elect, Aguascalientes 20256, Mexico
[2] Univ Guadalajara, Ctr Univ Los Lagos, Lagos 47460, Nigeria
[3] Ctr Invest Opt AC, Unidad Aguascalientes, Ags 20200, Mexico
[4] Intel Tecnol Mexico, SA CV, Syst Res Ctr, Tlaqueaque 45600, Jalisco, Mexico
[5] Ctr Invest Opt AC, Guanajuato 37150, Mexico
关键词
D O I
10.1088/0022-3727/40/16/025
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we develop a sensitive optical method to monitor the surface roughness in the investigation of surfaces. By applying this method to measure the RMS surface roughness of various surfaces, we found RMS values which are comparable to those obtained by atomic force microscopy measurements. In addition, we present a simple empirical model to calculate the RMS surface roughness which shows very good agreement with the surface roughness measurements taken by the method reported in this paper. Finally, the application of our method to the study of the LO-phonon mode of CdS suggests that its intensity is dominated by the surface roughness. This roughness dependent behaviour of the CdS LO-phonon mode is experimentally confirmed by using an excitation wavelength near its E-0 transition.
引用
收藏
页码:4922 / 4927
页数:6
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