共 15 条
Photoluminescence of patterned arrays of vertically stacked InAs/GaAs quantum dots
被引:13
作者:

Saucer, T. W.
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机构:
Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA

Lee, J-E.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA

Martin, A. J.
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h-index: 0
机构:
Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA

Tien, D.
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机构:
Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA

Millunchick, J. M.
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机构:
Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA

Sih, V.
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h-index: 0
机构:
Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA
机构:
[1] Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
基金:
美国国家科学基金会;
关键词:
Quantum Dots;
Semiconductors;
Molecular beam epitaxy;
Photoluminescence;
LUMINESCENCE;
D O I:
10.1016/j.ssc.2010.12.020
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
We report on photoluminescence measurements of vertically stacked InAs/GaAs quantum dots grown by molecular beam epitaxy on focused ion beam patterned hole arrays with varying array spacing. Quantum dot emission at 1.24 eV was observed only on patterned regions, demonstrating preferential nucleation of optically active dots at desired locations and below the critical thickness for dot formation at these growth conditions. Photoluminescence measurements as a function of varying focused ion beam irradiated hole spacing showed that the quantum dot emission intensity increased with decreasing array periodicity, consistent with increasing dot density. (C) 2010 Elsevier Ltd. All rights reserved.
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页码:269 / 271
页数:3
相关论文
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