Intrinsic n-type versus p-type doping asymmetry and the defect physics of ZnO -: art. no. 075205

被引:1769
作者
Zhang, SB [1 ]
Wei, SH [1 ]
Zunger, A [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
关键词
D O I
10.1103/PhysRevB.63.075205
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZnO typifies a class of materials that can be doped via native defects in only one way: either n type or p type. We explain this asymmetry in ZnO via a study of its intrinsic defect physics, including Zn-O, Zn-i, V-O, O-i, and V-Zn and n-type impurity dopants, Al and F. We find that ZnO is n type at Zn-rich conditions. This is because (i) the Zn interstitial, Zn-i, is a shallow, donor, supplying electrons; (ii) its formation enthalpy is low for both Zn-rich and O-rich conditions, so this defect is abundant; and (iii) the native defects that could compensate the n-type doping effect of Zn-i (interstitial O, O-i, and Zn vacancy, V-Zn), have high formation enthalpies for Zn-rich conditions, so these "electron killers" are not abundant. We find that ZnO cannot be doped p type via native defects (O-i, V-Zn) despite the fact that they are shallow (i.e., supplying holes at room temperature). This is because at both Zn-rich and O-rich conditions, the defects that could compensate p-type doping (V-O, Zn-i, Zn-O) have low formation enthalpies so these "hole killers" form readily. Furthermore, we identify electron-hole radiative recombination at the V-O center as the source of the green luminescence. In contrast, a large structural relaxation of the same center upon double hole capture leads to slow electron-hole recombination (either radiative or nonradiative) responsible for the slow decay of photoconductivity.
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页数:7
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共 41 条
  • [1] OPTICAL AND ELECTRICAL-PROPERTIES OF RADICAL BEAM GETTERING EPITAXY GROWN N-TYPE AND P-TYPE ZNO SINGLE-CRYSTALS
    BUTKHUZI, TV
    BUREYEV, AV
    GEORGOBIANI, AN
    KEKELIDZE, NP
    KHULORDAVA, TG
    [J]. JOURNAL OF CRYSTAL GROWTH, 1992, 117 (1-4) : 366 - 369
  • [2] GROUND-STATE OF THE ELECTRON-GAS BY A STOCHASTIC METHOD
    CEPERLEY, DM
    ALDER, BJ
    [J]. PHYSICAL REVIEW LETTERS, 1980, 45 (07) : 566 - 569
  • [3] Growth of ZnO single crystal thin films on c-plane (0 0 0 1) sapphire by plasma enhanced molecular beam epitaxy
    Chen, YF
    Bagnall, DM
    Zhu, ZQ
    Sekiuchi, T
    Park, KT
    Hiraga, K
    Yao, T
    Koyama, S
    Shen, MY
    Goto, T
    [J]. JOURNAL OF CRYSTAL GROWTH, 1997, 181 (1-2) : 165 - 169
  • [4] CHRISTENSEN NE, 1984, PHYS REV B, V30, P5753, DOI 10.1103/PhysRevB.30.5753
  • [5] EFFECT OF THERMOCHEMICAL REDUCTION ON THE ELECTRICAL, OPTICAL-ABSORPTION, AND POSITRON-ANNIHILATION CHARACTERISTICS OF ZNO CRYSTALS
    DELACRUZ, RM
    PAREJA, R
    GONZALEZ, R
    BOATNER, LA
    CHEN, Y
    [J]. PHYSICAL REVIEW B, 1992, 45 (12): : 6581 - 6586
  • [6] COMPENSATION OF P-TYPE DOPING IN ZNSE - THE ROLE OF IMPURITY-NATIVE DEFECT COMPLEXES
    GARCIA, A
    NORTHRUP, JE
    [J]. PHYSICAL REVIEW LETTERS, 1995, 74 (07) : 1131 - 1134
  • [7] Gordon RG, 1997, AIP CONF PROC, P39, DOI 10.1063/1.52856
  • [8] DEFECT STRUCTURE OF ZN-DOPED ZNO
    HAGEMARK, KI
    [J]. JOURNAL OF SOLID STATE CHEMISTRY, 1976, 16 (3-4) : 293 - 299
  • [9] MOMENTUM-SPACE FORMALISM FOR THE TOTAL ENERGY OF SOLIDS
    IHM, J
    ZUNGER, A
    COHEN, ML
    [J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1979, 12 (21): : 4409 - 4422
  • [10] p-type electrical conduction in ZnO thin films by Ga and N codoping
    Joseph, M
    Tabata, H
    Kawai, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1999, 38 (11A): : L1205 - L1207