Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS)

被引:13
作者
Alrebdi, Tahani A. [1 ]
Fayyaz, Amir [2 ]
Asghar, Haroon [2 ]
Zaman, Asif [3 ]
Asghar, Mamoon [4 ]
Alkallas, Fatemah H. [1 ]
Hussain, Atif [5 ]
Iqbal, Javed [6 ]
Khan, Wilayat [7 ]
机构
[1] Princess Nourah Bint Abdulrahman Univ, Coll Sci, Dept Phys, POB 84428, Riyadh 11671, Saudi Arabia
[2] Quaid I Azam Univ Campus, Natl Ctr Phys, Islamabad 45320, Pakistan
[3] Islamia Coll, Dept Phys, Peshawar 25000, Pakistan
[4] Univ Gujrat, Dept Phys, Hafiz Hayat Campus, Gujrat 50700, Pakistan
[5] Univ Lahore, Dept Phys, Gujrat Campus, Gujrat 50700, Pakistan
[6] Azad Jammu & Kashmir Univ, Dept Phys, Muzaffarabad 13100, Pakistan
[7] Bacha Khan Univ, Dept Phys, Charsadda 24420, Pakistan
来源
MOLECULES | 2022年 / 27卷 / 12期
关键词
CF-LIBS; AlGaAs; quantitative analysis; plasma parameters; compositional analysis; QUANTITATIVE ELEMENTAL ANALYSIS; MINOR ELEMENTS; NANOCOMPOSITES; MS;
D O I
10.3390/molecules27123754
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
In this work, we report the results of the compositional analysis of an aluminum gallium arsenide (AlGaAs) sample using the calibration-free laser-induced breakdown spectroscopy (CF-LIBS) technique. The AlGaAs sample was doped with three various concentrations of gallium (Ga), arsenic (As), and aluminum (Al), as reported by the manufacturer, and the CF-LIBS technique was employed to identify the doping concentration. A pulsed Q-switched Nd: YAG laser capable of delivering 200 and 400 mJ energy at 532 and 1064 nm, respectively, was focused on the target sample for ablation, and the resulting emission spectra were captured using a LIBS 2000+ spectrometer covering the spectral range from 200 to 720 nm. The emission spectra of the AlGaAs sample yielded spectral lines of Ga, As, and Al. These lines were further used to calculate the plasma parameters, including electron temperature and electron number density. The Boltzmann plot method was used to calculate the electron temperature, and the average electron temperature was found to be 5744 +/- 500 K. Furthermore, the electron number density was calculated from the Stark-broadened line profile method, and the average number density was calculated to be 6.5 x 10(17) cm(-3). It is further observed that the plasma parameters including electron temperature and electron number density have an increasing trend with laser irradiance and a decreasing trend along the plume length up to 2 mm. Finally, the elemental concentrations in terms of weight percentage using the CF-LIBS method were calculated to be Ga: 94%, Al: 4.77% and As: 1.23% for sample-1; Ga: 95.63%, Al: 1.15% and As: 3.22% for sample-2; and Ga: 97.32%, Al: 0.69% and As: 1.99% for sample-3. The certified concentrations were Ga: 95%, Al: 3% and As: 2% for sample-1; Ga: 96.05%, Al: 1% and As: 2.95% for sample-2; and Ga: 97.32%, Al: 0.69% and As: 1.99% for sample-3. The concentrations measured by CF-LIBS showed good agreement with the certified values reported by the manufacturer. These findings suggest that the CF-LIBS technique opens up an avenue for the industrial application of LIBS, where quantitative/qualitative analysis of the material is highly desirable.
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页数:13
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