Gate interfacial layer in hydrogen-terminated diamond field-effect transistors

Cross-sectional transmission microscopy images of hydrogen-terminated diamond field-effect transistor reveal interfacial layers between the metal and hydrogen-terminated diamond layer. Especially interesting is that an interfacial layer between Al and H-terminated diamond is clearly seen. This layer corresponds to the energy barrier, which we confirmed from an RF analysis of a diamond FET. During growth, an amorphous-like subsurface layer with vacancies has already formed on H-terminated diamond, and during subsequent metal evaporation, metal diffuses through vacancies into the subsurface layer, and eventually the interfacial layer forms. (C) 2008 Elsevier B.V. All rights reserved.