Study of fluorine contamination on MgO(100) surfaces

被引：4

作者：

Colera, I ^{[1
]}

Soria, E

de Segovia, JL

González, R

机构：

[1] Univ Carlos III Madrid, Dept Fis, E-28911 Leganes, Spain

[2] CETEF L Torres Quevedo, Inst Fis Aplicada, E-28006 Madrid, Spain

来源：

VACUUM | 1999年 / 52卷 / 1-2期

关键词：

D O I：

10.1016/S0042-207X(98)00206-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The fluorine contamination on MgO(100) surfaces is studied using Electron Stimulated Desorption (ESD) and Auger Electron Spectroscopy (AES). While Ar+ ion sputtering is very effective to clean the carbon contamination on the surface, the fluorine content does not significantly decrease. Thermal treatments of the sample considerably increase the F surface concentration due to its diffusion from the bulk to the surface. Healing the sample at 700 K simultaneously with H2O exposure produces a decrease in the fluorine signal. The ion kinetic energy distribution of the F+ ion shows two peaks at 2.4 and 5 eV. The threshold energy of the F+ ion desorption is at 60 eV. (C) 1998 Elsevier Science Ltd. All rights reserved.

引用

页码：103 / 108

页数：6

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