Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd and 3rd order FBG gratings using a femtosecond laser

被引:2
作者
Smith, Graham N. [1 ]
Kalli, Kyriacos [2 ]
Bennion, Ian [1 ]
Sugden, Kate [1 ]
机构
[1] Aston Univ, Photon Res Grp, Birmingham B4 7ET, W Midlands, England
[2] Cyprus Univ Technol, Nanophoton Res Lab, Limassol, Cyprus
来源
ADVANCED FABRICATION TECHNOLOGIES FOR MICRO/NANO OPTICS AND PHOTONICS II | 2009年 / 7205卷
基金
英国工程与自然科学研究理事会;
关键词
Phase masks; Femtosecond laser; inscription; laser-material interaction; fiber Bragg gratings; Talbot effect; OPTICAL-FIBERS; BRAGG GRATINGS; EXPOSURE;
D O I
10.1117/12.809175
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present to the best of our knowledge the first example of femtosecond laser inscription/ablation of phase/amplitude masks for the demonstrated purpose of inscribing Bragg gratings in optical fibers. We show that the utilization of a femtosecond laser for the mask production allows for great flexibility in controlling the mask period. The masks are used to produce 1(st), 2(nd) and 3(rd) order fiber Bragg gratings (FBGs) in SMF-28. The work demonstrates the proof of concept and flexibility for the use of femtosecond lasers for the rapid prototyping of complex and reproducible mask structures. Our inscription studies are augmented by considerations of three-beam interference effects that occur as a result of the strong zeroth-order component that is present in addition to higher-order diffraction components.
引用
收藏
页数:11
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