Oxidation Protection with Amorphous Surface Oxides: Thermodynamic Insights from Ab Initio Simulations on Aluminum

被引:51
作者
Aykol, Muratahan [1 ,3 ]
Persson, Kristin A. [1 ,2 ]
机构
[1] Lawrence Berkeley Natl Lab, Energy Storage & Distributed Resources Div, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Mat Sci, Berkeley, CA 94720 USA
[3] Toyota Res Inst, Los Altos, CA 94022 USA
关键词
surface films; polymorph selection; amorphous films; oxidation; corrosion; thin-film growth; aluminum; FE-CR ALLOYS; METALS-BASED CIVILIZATION; LOW-TEMPERATURE OXIDATION; TOTAL-ENERGY CALCULATIONS; WAVE BASIS-SET; PASSIVE FILM; THERMAL-OXIDATION; STABILITY; IRON; SEMICONDUCTORS;
D O I
10.1021/acsami.7b14868
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Native surface films play key role in the oxidation and corrosion protection of functional and structural Material's. Here, we present a fully ab initio approach for understanding the thermodynamic driving force behind the initial phase selection among amorphous and crystalline structures for a surface film growing on a crystalline substrate. We apply the approach to elucidate the competition among corundum (alpha), spinel (gamma), and amorphous (am).Al2O3 films growing on aluminum metal We show that the amorphous Al2O3 film becomes thermodynamically :the most stable form below around similar to 1 nm, that is, the relative energetic stabilities of thin polymorphic Al2O films, follow am. < gamma < alpha. As the film thickness increases, the relative stability relation first changes to gamma < alpha < aim. and then to the bulk limit of alpha < gamma < am. The nanoscale gamma flints distort substantially to, form,exclusively four- and fivefold-coordinated Al-O polyhedra, lose the dose-packed 0 framework, and become "amorphous-like", that is,exhibit both short-range order and energetic characteristics that are commensurate with the amorphous form. Our results provide a quantitative, first-principles confirmation for the early hypotheses On the thermodynamic stability of amorphous :surface films and provide insights for, the critical role they play in oxidation protection. Handling the complexities associated with the initial film growth, including bulk, surface, interface, and strain energy effects in realistically complex ab initio simulations, we expect this approach to contribute to understanding of the mechanism behind effective passivation films for aluminum alloys and beyond.
引用
收藏
页码:3039 / 3045
页数:7
相关论文
共 53 条
  • [11] LOW-TEMPERATURE OXIDATION
    FEHLNER, FP
    [J]. PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1987, 55 (06): : 633 - 636
  • [12] THIN OXIDE FILMS ON ALUMINUM
    GULBRANSEN, EA
    WYSONG, WS
    [J]. JOURNAL OF PHYSICAL AND COLLOID CHEMISTRY, 1947, 51 (05) : 1087 - 1103
  • [13] Gutiérrez G, 2002, PHYS REV B, V65, DOI [10.1103/PhysRevB.65.104202, 10.1103/PhysRevB.65.012101]
  • [14] Molecular dynamics simulations of the nano-scale room-temperature oxidation of aluminum single crystals
    Hasnaoui, A
    Politano, O
    Salazar, JM
    Aral, G
    Kalia, RK
    Nakano, A
    Vashishta, P
    [J]. SURFACE SCIENCE, 2005, 579 (01) : 47 - 57
  • [15] Oxygen and aluminum diffusion in α-Al2O3:: How much do we really understand?
    Heuer, A. H.
    [J]. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2008, 28 (07) : 1495 - 1507
  • [16] Jain A., 2015, CONCURRENCY COMPUT P
  • [17] Commentary: The Materials Project: A materials genome approach to accelerating materials innovation
    Jain, Anubhav
    Shyue Ping Ong
    Hautier, Geoffroy
    Chen, Wei
    Richards, William Davidson
    Dacek, Stephen
    Cholia, Shreyas
    Gunter, Dan
    Skinner, David
    Ceder, Gerbrand
    Persson, Kristin A.
    [J]. APL MATERIALS, 2013, 1 (01):
  • [18] Structure and morphology of aluminium-oxide films formed by thermal oxidation of aluminium
    Jeurgens, LPH
    Sloof, WG
    Tichelaar, FD
    Mittemeijer, EJ
    [J]. THIN SOLID FILMS, 2002, 418 (02) : 89 - 101
  • [19] Growth kinetics and mechanisms of aluminum-oxide films formed by thermal oxidation of aluminum
    Jeurgens, LPH
    Sloof, WG
    Tichelaar, FD
    Mittemeijer, EJ
    [J]. JOURNAL OF APPLIED PHYSICS, 2002, 92 (03) : 1649 - 1656
  • [20] Thermodynamic stability of amorphous oxide films on metals: Application to aluminum oxide films on aluminum substrates
    Jeurgens, LPH
    Sloof, WG
    Tichelaar, FD
    Mittemeijer, EJ
    [J]. PHYSICAL REVIEW B, 2000, 62 (07): : 4707 - 4719