Low-temperature deposition of ultrafine rutile TiO2 thin films by the hydrothermal method

被引：21

作者：

Chen, QW ^{[1
]}

Qian, YT ^{[1
]}

Chen, ZY ^{[1
]}

Jia, YB ^{[1
]}

Zhou, GE ^{[1
]}

Li, XG ^{[1
]}

Zhang, YH ^{[1
]}

机构：

[1] UNIV SCI & TECHNOL CHINA,DEPT APPL CHEM,HEFEI 230026,PEOPLES R CHINA

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1996年 / 156卷 / 02期

关键词：

D O I：

10.1002/pssa.2211560216

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ultrafine (50 x 20 nm(2)) rutile TiO2 thin films (0.18 mu m) on alpha-Al2O3 substrates have,een prepared by hydrothermal treatment of a solution of a mixture of TiO42- (0.5 M) and HNO3(2.0 M) at low temperatures. Films prepared in the temperature range of 100 to 200 degrees C contain only the rutile phase and adhere well to the substrates. The acidity of the solution and the hydrothermal treatment time are the critical parameters determining the formation of pure rutile phase.

引用

页码：381 / 385

页数：5

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