Electron beam lithography of nanostructures using 2-propanol:water and 2-propanol:methyl isobutyl ketone as developers for poly-methylmethacrylate

被引：8

作者：

Lavallee, E ^{[1
]}

Beauvais, J

Beerens, J

机构：

[1] Univ Sherbrooke, Ctr Rech Phys Solide, Dept Genie Elect & Informat, Sherbrooke, PQ J1K 2R1, Canada

[2] Univ Sherbrooke, Ctr Rech Phys Solide, Dept Phys, Sherbrooke, PQ J1K 2R1, Canada

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 03期

关键词：

D O I：

10.1116/1.589996

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

[No abstract available]

引用

页码：1255 / 1257

页数：3

共 7 条

[1] ON THE ATTAINMENT OF OPTIMUM DEVELOPER PARAMETERS FOR PMMA RESIST [J].

BERNSTEIN, GH ;

HILL, DA .

SUPERLATTICES AND MICROSTRUCTURES, 1992, 11 (02) :237-240

[2] FABRICATION OF SUB-10 NM STRUCTURES BY LIFT-OFF AND BY ETCHING AFTER ELECTRON-BEAM EXPOSURE OF POLY(METHYLMETHACRYLATE) RESIST ON SOLID SUBSTRATES [J].

CHEN, W ;

AHMED, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2519-2523

[3]

FISHER PB, 1993, J VAC SCI TECHNOL B, V11, P2524

[4]

MACKIE S, 1985, SOLID STATE TECHNOL, V28, P117

[5]

MOSHIN MA, 1988, POLYMER, V29, P2130

[6] ENGINEERING SUB-50 NM QUANTUM EFFECT DEVICES AND SINGLE-ELECTRON TRANSISTORS USING ELECTRON-BEAM LITHOGRAPHY [J].

WANG, Y ;

CHOU, SY .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :2962-2965

[7] RESIST HEATING EFFECT IN ELECTRON-BEAM LITHOGRAPHY [J].

YASUDA, M ;

KAWATA, H ;

MURATA, K ;

HASHIMOTO, K ;

HIRAI, Y ;

NOMURA, N .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (03) :1362-1366

← 1 →