Plasma deposition of various fluorinated precursors for low dielectric constant materials

被引：0
|
作者：
Dietlmeier, M
Maier, G
Klumpp, A
机构：
[1] Tech Univ Munchen, Lehrstuhl Makromol Stoffe, D-85748 Garching, Germany
[2] Fraunhofer Inst Solid State Technol, D-80686 Munich, Germany
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1998年 / 216卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
454-POLY
引用
收藏
页码：U136 / U136
页数：1
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