Electronic Transport in Heterostructures of Chemical Vapor Deposited Graphene and Hexagonal Boron Nitride

被引:14
作者
Qi, Zhengqing John [1 ]
Hong, Sung Ju [2 ]
Rodriguez-Manzo, Julio A. [1 ]
Kybert, Nicholas J. [1 ]
Gudibande, Rajatesh [3 ]
Drndic, Marija [1 ]
Park, Yung Woo [2 ]
Johnson, A. T. Charlie [1 ]
机构
[1] Univ Penn, Dept Phys & Astron, Philadelphia, PA 19104 USA
[2] Seoul Natl Univ, Dept Phys & Astron, Seoul 151747, South Korea
[3] Univ Penn, Nano Bio Interface Ctr, Philadelphia, PA 19104 USA
基金
美国国家科学基金会;
关键词
WAFER-SCALE; THERMAL-CONDUCTIVITY; EPITAXIAL GRAPHENE; ATOMIC-STRUCTURE; LAYER GRAPHENE; GROWTH; OXIDATION; MOBILITY; LIMITS;
D O I
10.1002/smll.201402543
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
CVD graphene devices on stacked CVD hexagonal boron nitride (hBN) are demonstrated using a novel low-contamination transfer method, and their electrical performance is systematically compared to devices on SiO2. An order of magnitude improvement in mobility, sheet resistivity, current density, and sustained power is reported when the oxide substrate is covered with five-layer CVD hBN. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:1402 / 1408
页数:7
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