Bilayer thickness effects on nanoindentation behavior of Ag/Ni multilayers

被引：55
|
作者：
Kang, Bong C. [1 ]
Kim, Hee Y. [1 ]
Kwon, Oh Y. [1 ]
Hong, Soon H. [1 ]
机构：
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
来源：
SCRIPTA MATERIALIA | 2007年 / 57卷 / 08期
关键词：
multilayer thin films; sputtering; nanoindentation; hardness; hall-petch relationship;
D O I：
10.1016/j.scriptamat.2007.06.038
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The effects of bilayer thickness on the mechanical behavior of Ag/Ni nanomultilayers have been investigated by nanoindentation hardness and creep tests. The hardness increased with decreasing bilayer thickness, although as the bilayer thickness decreased below 8 nm there was a decrease in hardness that correlated well with increasing creep rate. The dependence of the creep rate on the bilayer thickness reveals that the grain boundary deformation is more dominant at bilayer thicknesses below 8 nm. (c) 2007 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：703 / 706
页数：4
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