157-nm laser-induced modification of fused-silica glasses

被引:23
作者
Zhang, J [1 ]
Herman, PR [1 ]
Lauer, C [1 ]
Chen, KP [1 ]
Wei, M [1 ]
机构
[1] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G5, Canada
来源
LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING VI | 2001年 / 4274卷
关键词
F-2; laser; laser damage; photosensitivity; fused silica; refractive index; color center;
D O I
10.1117/12.432504
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Bulk laser modification is reported for hydroxyl (OH), chlorine (Cl) and fluorine (F) containing fused-silica glasses irradiated with 157-nm F-2-laser light. We detail the effects of OH, Cl and F concentration, as well as hydrogen (H-2) loading, on compaction, refractive-index change, and color-center formation. Volume gratings formed with several tens of kJ/cm(2), fluence yielded surface-relief gratings of several tens of nm amplitude and bulk refractive-index changes of nearly 10(-3) in both OH- and Cl-content glasses that were pre-soaked in high-pressure hydrogen. H-2-loading offered a similar to2-fold increase in 157-nm glass photosensitivity, and also increased the 157-nm material absorption by several factors during the exposure. In contrast, F-doped glass did not offer a measurable 157-nm photosensitivity, and the 157-nm absorption showed a surprising order-of-magnitude drop following a similar to 10-kJ/cm(2) laser dose.
引用
收藏
页码:125 / 132
页数:4
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