Voltage and temperature scalable gate delay and slew models including intra-gate variations

被引:4
作者
Das, Bishnu Prasad [1 ]
Janakiraman, V [2 ]
Amrutur, Bharadwaj [2 ]
Jamadagni, H. S. [1 ]
Arvind, N. V. [3 ]
机构
[1] Indian Inst Sci, CEDT, Bangalore 560012, Karnataka, India
[2] Indian Inst Sci, Dept Ece, Bangalore, Karnataka, India
[3] Texas Instruments Inc, Bangalore, Karnataka, India
来源
21ST INTERNATIONAL CONFERENCE ON VLSI DESIGN: HELD JOINTLY WITH THE 7TH INTERNATIONAL CONFERENCE ON EMBEDDED SYSTEMS, PROCEEDINGS | 2008年
关键词
D O I
10.1109/VLSI.2008.92
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
We investigate the feasibility of developing a comprehensive gate delay and slew models which incorporates output load, input edge slew, supply voltage, temperature, global process variations and local process variations all in the same model. We find that the standard polynomial models cannot handle such a large heterogeneous set of input variables. We instead use neural networks, which are well known for their ability to approximate any arbitrary continuous function. Our initial experiments with a small subset of standard cell gates of an industrial 65nm library show promising results with error in mean less than 1%, error in standard deviation less than 3% and maximum error less than 11% as compared to SPICE for models covering 0.9-1.1V of supply, -40 degrees C to 125 degrees C of temperature, load, slew and global and local process parameters. Enhancing the conventional libraries to be voltage and temperature scalable with similar accuracy requires on an average 4x more SPICE characterization runs.
引用
收藏
页码:685 / +
页数:2
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