Reliability and failure analysis in power GaN-HEMTs: an overview

被引:70
作者
Meneghini, Matteo [1 ]
Rossetto, Isabella [1 ]
De Santi, Carlo [1 ]
Rampazzo, Fabiana [1 ]
Tajalli, Alaleh [1 ]
Barbato, Alessandro [1 ]
Ruzzarin, Maria [1 ]
Borga, Matteo [1 ]
Canato, Eleonora [1 ]
Zanoni, Enrico [1 ]
Meneghesso, Gaudenzio [1 ]
机构
[1] Univ Padua, Dept Informat Engn, Via Gradenigo 6-B, I-35131 Padua, Italy
来源
2017 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS) | 2017年
关键词
GaN; transistor; reliability; defect; degradation; ALGAN/GAN HEMTS; MIS-HEMTS; BREAKDOWN; DEGRADATION; TRANSISTOR; TRAPS;
D O I
10.1109/IRPS.2017.7936282
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Power GaN transistors have recently demonstrated to be excellent devices for application in power electronics. The high breakdown field and the superior mobility of the 2-dimensional electron gas allow to fabricate transistors with low resistive and switching losses, that permit to increase the efficiency of switching mode power converters beyond 99 %. GaN-based transistors are currently supposed to be adopted in KW-range power converters; 650 V transistors are already available on the market, and 1200 V devices are currently under development. During operation, GaN power transistors can reach critical conditions, especially in the off-state (with a high V-DS, in excess of 650 V), during hard-switching (where high current and voltage can be simultaneously present), and for high positive gate voltages (in the case of normally-off devices). This paper reports our most recent results on the gradual and catastrophic degradation of GaN-based power HEMTs. We present the results of three different case studies, on: (i) the time-dependent breakdown of power HEMTs submitted to high off-state stress; (ii) the degradation of HEMTs with p-GaN gate submitted to high gate stress; (iii) the hot electron effects in GaN-MISHEMTs submitted to high-temperature source current stress.
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页数:8
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