Positronium reemission yield from mesostructured silica films

被引：76

作者：

Liszkay, L. ^{[1
,2
]}

Corbel, C. ^{[1
,2
]}

Perez, P. ^{[1
,2
]}

Desgardin, P. ^{[3
]}

Barthe, M. -F. ^{[3
]}

Ohdaira, T. ^{[4
]}

Suzuki, R. ^{[4
]}

Crivelli, P. ^{[5
]}

Gendotti, U. ^{[5
]}

Rubbia, A. ^{[5
]}

Etienne, M. ^{[6
]}

Walcarius, A. ^{[6
]}

机构：

[1] CEA Saclay, DSM IRFU, F-91191 Gif Sur Yvette, France

[2] CEA Saclay, IRAMIS, F-91191 Gif Sur Yvette, France

[3] CNRS, CERI, F-45071 Orleans, France

[4] AIST, Tsukuba, Ibaraki 3058568, Japan

[5] ETHZ, Inst Teilchenphys, CH-8093 Zurich, Switzerland

[6] Nancy Univ, CNRS, LCPME, F-54600 Villers Les Nancy, France

来源：

APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 06期

关键词：

D O I：

10.1063/1.2844888

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The reemission yield of ortho-positronium (o-Ps) into vacuum outside mesoporous silica films on glass is measured in reflection mode with a specially designed lifetime (LT) spectrometer. Values as high as 40% are found. The intensity of the 142 ns vacuum LT is recorded as a function of reemission depth. The LT depth profiling is correlated to the 2 gamma and 3 gamma energy ones to determine the annihilation characteristics inside the films. Positron lifetime in capped films is used to determine the pore size. For the first time, a set of consistent fingerprints for positronium annihilation, o-Ps reemission into vacuum, and pore size, is directly determined in surfactant-templated mesoporous silica films. (c) 2008 American Institute of Physics.

引用

页数：3

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