Five-fold branched Si particles in laser clad AlSi functionally graded materials

被引:70
作者
Pei, YT
De Hosson, JTM
机构
[1] Univ Groningen, Dept Appl Phys, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands
[2] Univ Groningen, Netherlands Inst Met Res, NL-9747 AG Groningen, Netherlands
关键词
twinning; aluminium alloys; transmission electron microscopy (TEM); microstructure;
D O I
10.1016/S1359-6454(00)00364-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Many five-fold branched Si particles (Si-p) were observed in A1-40 wt% Si functionally graded materials produced by a single-step laser cladding process on cast Al-alloy substrate. In this paper the fivefold twinning and growth features of Si-p are scrutinized with orientation imaging microscopy and electron microscopic examination. It is a more in depth study of formation of the Si particles in functionally graded materials as published in our previous paper [Pei, Y. T. and De Hosson, J. Th. M.: Acta mater., 2000, 48, 2617]. These Si particles have grown from twinned decahedron nuclei consisting of five tetrahedrons that share a common 110 axis. The twin plane re-entrant edge (TPRE) mechanism explains both the branch growth in the radial direction and the elongation of Si, along their common 110 axis. Subsequent twinning within the twinned tetrahedrons provides additional re-entrant grooves on their top faces, which are important for the rapid elongation and consequently for the continuous growth of the branched particle. The 7.5 degrees mismatch that arises by putting together five tetrahedrons around a common 110 axis is accommodated by small-angle grain boundaries (SAGBs). The SAGBs may disturb the progress of growth steps, which causes the particles to branch. The most remarkable facts of the study are that the five-fold branched silicon particles are much bigger (25 similar to 40 mum) than the nanometer sizes previously reported in the literature and the 7.5 degrees mismatch is accommodated mainly by multiple SAGBs. The examples of a single SAGE reported before are just a special case of the SAGE mechanism. (C) 2001 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:561 / 571
页数:11
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