Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors

被引：52

作者：

Cheng, Xinbin ^{[1
,2
]}

Shen, Zhengxiang ^{[1
,2
]}

Jiao, Hongfei ^{[1
,2
,3
]}

Zhang, Jinlong ^{[1
,2
]}

Ma, Bin ^{[1
,2
,3
]}

Ding, Tao ^{[1
,2
]}

Lu, Jiangtao ^{[1
,2
]}

Wang, Xiaodong ^{[1
,2
]}

Wang, Zhanshan ^{[1
,2
]}

机构：

[1] Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China

[2] Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China

[3] Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China

来源：

APPLIED OPTICS | 2011年 / 50卷 / 09期

基金：

中国国家自然科学基金;

关键词：

MULTILAYER COATINGS; THIN-FILMS; DEFECTS; INTENSIFICATION; DEPOSITION;

D O I：

10.1364/AO.50.00C357

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A reactive electron beam evaporation process was used to fabricate 1.064 mu m HfO2/SiO2 high reflectors. The deposition process was optimized to reduce the nodular density. Cross-sectioning of nodular defects by a focused ion-beam milling instrument showed that the nodule seeds were the residual particles on the substrate and the particulates from the silica source "splitting." After optimizing the substrate preparation procedure and the evaporation process, a low nodular density of 2.7/mm(2) was achieved. The laser damage test revealed that the ejection fluences and damage growth behaviors of nodules created from deep or shallow seeds were totally different. A mechanism based on directional plasma scald was proposed to interpret observed damage growth phenomenon. (C) 2011 Optical Society of America

引用

页码：C357 / C363

页数：7

共 13 条

[1] Improved method for laser damage testing coated optics - art. no. 59912A [J].