Effect of doping level on high-temperature operation of InAs/GaAs quantum dot infrared photodetectors

被引:1
|
作者
Seo, Dong-Bum [1 ]
Tien Dai Nguyen [1 ]
Kim, Eui-Tae [1 ]
机构
[1] Chungnam Natl Univ, Dept Mat Sci & Engn, 220 Gung Dong, Taejon 305764, South Korea
关键词
quantum dots; infrared photodetectors; QDIPs; InAs; MBE; SIZE; WELL;
D O I
10.1504/IJNT.2016.077088
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This study reports the effect of doping level on the performance of InAs/ GaAs quantum-dot infrared photodetectors (QDIPs). Two QDIP samples were prepared via molecular beam epitaxy: n(+)-i(QDs)-n(+) QDIP with undoped quantum dot (QD) active region, referred to as undoped QDIP, and n(+)-n(QDs)n(+) QDIPs intended to contain two electrons per QDs, referred to as doped QDIP. InAs self-assembled QDs were grown on GaAs (001) wafers by three mono-layers of InAs deposition. Both QDIPs showed a photoluminescence peak at 1.182 mu m as well as a similar broad photocurrent (PC) spectrum peaked at about 7.5 mu m, ranging from 4 mu m to 9 mu m at 5 K. Undoped QDIP yielded a PC spectrum of up to 100 K, whereas doped QDIP had a PC spectrum of up to 40 K only. This finding was mainly attributed to the lower dark current properties of undoped QDIP. Undoped QDIP at 77 K showed five orders of magnitude lower than the dark current of doped QDIP at 5 K.
引用
收藏
页码:385 / 391
页数:7
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