Interface Temperature Measurement and Experimental Studies of Super-high Speed Polishing of CVD diamond Films

被引：0

作者：

Huang, Shutao ^{[1
]}

Zhou, Li ^{[1
]}

Xu, Lifu ^{[1
]}

机构：

[1] Shenyang Ligong Univ, Sch Mech Engn, Shenyang 110159, Peoples R China

来源：

SURFACE FINISHING TECHNOLOGY AND SURFACE ENGINEERING II | 2010年 / 135卷

关键词：

Super-high speed polishing; CVD diamond film; Interface temperature; Polishing plate material; POLYCRYSTALLINE DIAMOND; SURFACE;

D O I：

10.4028/www.scientific.net/AMR.135.271

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

Super-high speed polishing of diamond film is a newly proposed method due to its outstanding features such as low cost and simple apparatus. The interface temperature rise is due to the friction force and the relative sliding velocity between the CVD diamond film and the polishing metal plate surface. In this paper, the interface temperature rise in super-high speed polishing of CVD diamond film was investigated by using the single-point temperature measurement method. Additionally, the influence of polishing plate material on the characteristics of super-high speed polishing has been studied. The results showed that cast iron is not suitable for super-high polishing, while both 0Cr18Ni9 stainless steel and pure titanium can be used for the super-high polishing of CVD diamond film. The quality and efficiency of polishing with 0Cr18Ni9 stainless steel plate is much higher than those of pure titanium, and the material removal rate could reach to 36-51 mu m/h when the polishing speed and pressure are 100 m/s and 0.17-0.31 MPa, respectively.

引用

页码：271 / 276

页数：6