Roughening of atomically flat diamond (111) surfaces by a hot HNO3/H2SO4 solution

被引：14

作者：

Tokuda, Norio ^{[1
]}

Umezawa, Hitoshi ^{[2
]}

Ri, Sung-Gi ^{[1
,3
]}

Yamabe, Kikuo ^{[4
,5
]}

Okushi, Hideyo ^{[1
]}

Yamasaki, Satoshi ^{[1
,4
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, Nanotechnol Res Inst, High Temp Quantum Elect Grp, Tsukuba, Ibaraki 3058568, Japan

[2] Natl Inst Adv Ind Sci & Technol, Diamond Res Ctr, Tsukuba, Ibaraki 3058568, Japan

[3] Japan Sci & Technol Corp, CREST, Tokyo, Japan

[4] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

[5] Univ Tsukuba, Tsukuba Res Ctr Interdisciplinary Mat Sci TIMS, Tsukuba, Ibaraki 3058571, Japan

来源：

DIAMOND AND RELATED MATERIALS | 2008年 / 17卷 / 4-5期

基金：

日本学术振兴会;

关键词：

surface; morphology; oxidation; etching;

D O I：

10.1016/j.diamond.2008.01.042

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A systematic investigation of the roughening of atomically flat diamond (111) surfaces by immersion in a hot mixture of HNO3/H2SO4 acids was performed using atomic force microscopy. Before the immersion the diamond surfaces were atomically flat, with single bilayer steps and terraces; surface roughness increased after the immersion in the hot acid mixture. This result suggests that surface oxidation by the hot acid mixture etches the surface causing surface roughening. (C) 2008 Elsevier B.V. All fights reserved.

引用

收藏

页码：486 / 488

页数：3

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