Nanoparticle-based lift-off technique for ultra-thin nanoporous film preparation

被引：2

作者：

Wang Wei ^{[1
]}

Zhao Yu ^{[1
]}

Lei YinHua ^{[1
]}

Li ZhiHong ^{[1
]}

机构：

[1] Peking Univ, Inst Microelect, Natl Key Lab Nano Micro Fabricat Technol, Beijing 100871, Peoples R China

来源：

SCIENCE IN CHINA SERIES F-INFORMATION SCIENCES | 2008年 / 51卷 / 06期

基金：

中国国家自然科学基金;

关键词：

nanoparticle; lift-off; nanoporous film;

D O I：

10.1007/s11432-008-0055-8

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

Ultra-thin membrane with nanoscale through hole has great potential in biomedical applications, where precise controllability of porosity, pore size and film thickness is urgently required. The present work proposed a cost-effective way to prepare the ultra-thin nanoporous film with a promising controllability. Monodispersed nanoparticle, rather than photoresist, is used as the sacrificial material for this new lift-off process. By releasing the particles, holes can be achieved with predetermined characters. A 110 nm-thick nanoporous aluminum film with well-controlled pore's diameter was successfully fabricated to validate the technique. The technique has wider process window and better applicability than other nanofabrication methods.

引用

页码：819 / 824

页数：6

共 7 条

[1] Large on-off ratios and negative differential resistance in a molecular electronic device [J].