Effect of temperature on gas oxynitriding of Ti-6Al-4V alloy

被引:18
作者
Pohrelyuk, I. [1 ]
Morgiel, J. [2 ]
Tkachuk, O. [1 ]
Szymkiewicz, K. [2 ]
机构
[1] Natl Acad Sci Ukraine, Karpenko Physicomech Inst, UA-79060 Lvov, Ukraine
[2] Polish Acad Sci, Inst Met & Mat Sci, PL-30059 Krakow, Poland
关键词
Ti-6A1-4V alloy; Gas oxynitriding; XRD; TEM; TITANIUM OXYNITRIDE; TIOXNY FILMS; NITROGEN; OXYGEN; BEAM;
D O I
10.1016/j.surfcoat.2019.01.015
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The oxynitriding of Ti-6Al-4V alloy was carried out by the adding of controlled oxygen-containing environment into the system at the final stage of nitriding (during cooling). It was determined that oxynitriding was more intensive at 950 degrees C than at 750 degrees C and led to formation of surface layer based on TiO2 phase in the modification of rutile, 8-TiN-type and delta'-Ti2N phases, with the thickness 2 pm. At the lower temperature the surface layer was twice thinner and contained alpha"-Ti instead of delta'-Ti2N. 8-TiN-type phase showed the presence of twinning and stacking faults on 111 planes that can be explained by the penetration of oxygen into the lattice (substitution of nitrogen atoms by oxygen ones and formation of TiNxOy phase). By increasing temperature during oxynitriding from 750 degrees C to 950 degrees C, the surface microhardness of Ti-6AI-4V alloy increases from 10 GPa to 17 GPa, and the thickness of the diffusion layer-from similar to 40 to 70 mu m.
引用
收藏
页码:103 / 109
页数:7
相关论文
共 22 条
[1]   Ion beam studies of TiNxOy thin films deposited by reactive magnetron sputtering [J].
Alves, E ;
Ramos, AR ;
Barradas, NP ;
Vaz, F ;
Cerqueira, P ;
Rebouta, L ;
Kreissig, U .
SURFACE & COATINGS TECHNOLOGY, 2004, 180 :372-376
[2]   Sputtered titanium oxynitride coatings for endosseous applications: Physical and chemical evaluation and first bioactivity assays [J].
Banakh, Oksana ;
Moussa, Mira ;
Matthey, Joel ;
Pontearso, Alessandro ;
Cattani-Lorente, Maria ;
Sanjines, Rosendo ;
Fontana, Pierre ;
Wiskott, Anselm ;
Durual, Stephane .
APPLIED SURFACE SCIENCE, 2014, 317 :986-993
[3]   Preparation and characterization of titanium oxy-nitride thin films [J].
Braic, M. ;
Balaceanu, M. ;
Vladescu, A. ;
Kiss, A. ;
Braic, V. ;
Epurescu, G. ;
Dinescu, G. ;
Moldovan, A. ;
Birjega, R. ;
Dinescu, M. .
APPLIED SURFACE SCIENCE, 2007, 253 (19) :8210-8214
[4]   Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process [J].
Chappe, Jean-Marie ;
Martin, Nicolas ;
Lintymer, Jan ;
Sthal, Fabrice ;
Terwagne, Guy ;
Takadoum, Jamal .
APPLIED SURFACE SCIENCE, 2007, 253 (12) :5312-5316
[5]   Microstructure and magnetic properties of oxidized titanium nitride thin films in situ grown by pulsed laser deposition [J].
Chen, S. C. ;
Sung, K. Y. ;
Tzeng, W. Y. ;
Wu, K. H. ;
Juang, J. Y. ;
Uen, T. M. ;
Luo, C. W. ;
Lin, J-Y ;
Kobayashi, T. ;
Kuo, H. C. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (07)
[6]   Visible-light photocatalytic activity of TiOxNy thin films obtained by reactive multi-pulse High Power Impulse Magnetron Sputtering [J].
Demeter, Alexandra ;
Samoila, Florentina ;
Tiron, Vasile ;
Stanescu, Dana ;
Magnan, Helene ;
Straticiuc, Mihai ;
Burducea, Ion ;
Sirghi, Lucel .
SURFACE & COATINGS TECHNOLOGY, 2017, 324 :614-619
[7]  
Gotman I., 2014, ADV BIOMATER DEVICES, V1, P53
[8]   Characterization of TiOxNy films grown by PECVD method: Structural and optical properties [J].
Jung, C. K. ;
Bae, I. S. ;
Song, Y. H. ;
Cho, S. J. ;
Boo, J. H. .
SCIENCE AND TECHNOLOGY OF HYBRID MATERIALS, 2006, 111 :151-154
[9]   The physiochemical properties of TiOxNy films with controlled oxygen partial pressure [J].
Jung, MJ ;
Nam, KH ;
Chung, YM ;
Boo, JH ;
Han, JG .
SURFACE & COATINGS TECHNOLOGY, 2003, 171 (1-3) :71-74
[10]   XRD and AES characterization of TiOX,Ny thin films grown by ion assisted deposition [J].
Martev, IN .
VACUUM, 2002, 67 (02) :261-265