The ozone solubility and its decay in aqueous solutions: Crucial issues in ozonated chemistries for semiconductor cleaning

被引：10

作者：

De Smedt, F

De Gendt, S

Heyns, MM

Vinckier, C

机构：

[1] Katholieke Univ Leuven, Dept Chem, BE-3001 Leuven, Belgium

[2] IMEC VZW, BE-3001 Leuven, Belgium

来源：

ULTRA CLEAN PROCESSING OF SILICON SURFACES 2000 | 2001年 / 76-77卷

关键词：

decomposition; kinetics; ozone; semiconductor cleaning; solubility;

D O I：

10.4028/www.scientific.net/SSP.76-77.211

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The ozone decomposition rate in ultrapure water and the ozone solubility therein were investigated as a function of temperature, pH and nature of the additive used. The ozone decay rate is low (< 5.7 10(-5) s(-1)) at low pH except when HCl is used. Higher temperatures lead to higher ozone decay rates. The ozone solubility is temperature dependent: less ozone can be dissolved at higher temperature at a constant partial pressure in the gas phase. The solubility evolves towards a maximum at low pH except when HCl is present.

引用

页码：211 / 214

页数：4

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