In this study, we synthesized hollandite-type manganese oxide octahedral molecular sieves (OMS) with different potassium content (KxMn8O16; K-OMS-2). Owing to crystal growth, the specific surface area of K-OMS-2 decreased with an increase in the K concentration for x > 1.5. The K-OMS-2 samples with x < 1.5 exhibited NO adsorption at low temperatures because of an oxidation reaction of NO. The amount of adsorbed NO depended on the oxidation activity of K-OMS-2 instead of the specific surface area (i.e., the number of NO adsorption sites). The amount of NO that was adsorbed at 323 K was correlated to the increase in the amount of oxygen released from K-OMS-2. It is assumed that the thermally unstable oxygen sites acted as oxidation sites for NO at low temperatures and thus increased the amount of adsorbed NO. (C) 2016 Elsevier B.V. All rights reserved.
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Wong-Ng, Winnie
Kaduk, James A.
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IIT, BCS Chem Div, Chicago, IL 60616 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Kaduk, James A.
Allen, Andrew J.
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Allen, Andrew J.
Snyder, Chad R.
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Snyder, Chad R.
Chiu, Chun
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Chiu, Chun
Siderius, Daniel W.
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Siderius, Daniel W.
Li, Lan
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Li, Lan
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Cockayne, Eric
Espinal, Anais E.
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Univ Connecticut, Inst Mat Sci, Storrs, CT 06269 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Espinal, Anais E.
Suib, Steven L.
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Univ Connecticut, Inst Mat Sci, Storrs, CT 06269 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Wong-Ng, Winnie
Kaduk, James A.
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IIT, BCS Chem Div, Chicago, IL 60616 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Kaduk, James A.
Allen, Andrew J.
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Allen, Andrew J.
Snyder, Chad R.
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Snyder, Chad R.
Chiu, Chun
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Chiu, Chun
Siderius, Daniel W.
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Siderius, Daniel W.
Li, Lan
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Natl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Li, Lan
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Cockayne, Eric
Espinal, Anais E.
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Univ Connecticut, Inst Mat Sci, Storrs, CT 06269 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA
Espinal, Anais E.
Suib, Steven L.
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Univ Connecticut, Inst Mat Sci, Storrs, CT 06269 USANatl Inst Stand & Technol, Mat Measurements Lab, Gaithersburg, MD 20899 USA