Leakage current origins and passivation effect of GaN-based light emitting diodes fabricated with Ag p-contacts

被引:30
作者
Kim, Hyunsoo [1 ]
Cho, Jaehee [1 ]
Park, Yongjo [1 ]
Seong, Tae-Yeon [2 ]
机构
[1] Samsung Electromech Co, OS Lab, Suwon 443743, South Korea
[2] Korea Univ, Dept Mat Sci & Engn, Seoul 136713, South Korea
关键词
D O I
10.1063/1.2844887
中图分类号
O59 [应用物理学];
学科分类号
摘要
The origins of leakage currents and passivation effects of GaN-based light emitting diodes fabricated with Ag p-contacts have been investigated by electrical measurements. A significant increase in reverse leakage current is attributed to the surface migration of Ag. A passivation of mesa sidewalls by SiO2 is found to be effective in suppressing the reverse leakage. However, the passivation results in a somewhat increase in the forward leakage at moderate voltages. Such forward leakage is explained in terms of the presence of local deep-level states in p-GaN generated during SiO2 deposition, acting as a parasitic diode with a lower barrier height. (C) 2008 American Institute of Physics.
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页数:3
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