Normally-OFF Diamond Reverse Blocking MESFET

被引:8
作者
Canas, J. [1 ,2 ]
Pakpour-Tabrizi, A. C. [3 ,4 ]
Trajkovic, T. [5 ]
Udrea, F. [6 ]
Eon, D. [1 ]
Gheeraert, E. [1 ]
Jackman, R. B. [3 ,4 ]
机构
[1] Univ Grenoble Alpes, CNRS, Grenoble INP, Inst NEEL, F-38042 Grenoble, France
[2] Univ Cadiz, Dept Mat Sci & Met Engn, Cadiz 11003, Spain
[3] Univ Coll London UCL, London Ctr Nanotechnol, London WC1H 0AH, England
[4] Univ Coll London UCL, Dept Elect & Elect Engn, London WC1H 0AH, England
[5] Cambridge Microelect Ltd, Cambridge CB3 0QH, England
[6] Univ Cambridge, Dept Engn, Cambridge CB3 0FA, England
基金
英国工程与自然科学研究理事会; 欧盟地平线“2020”;
关键词
Diamond; MESFET; molybdenum; Schottky; BREAKDOWN VOLTAGE;
D O I
10.1109/TED.2021.3117237
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Schottky contacts have been used to fabricate normally-(OFF) lateral reverse-blocking MESFETs on p-type (boron-doped) O-terminated monocrystalline diamond. The devices utilized an ohmic source contact but both gate and drain contacts were Schottky in nature. Boron-doped p-channel diamond MESFETs reported to date display the less attractive normally-(ON) characteristics. Here, the normally-(OFF) transistor delivered a current level of similar to 1.5 mu Amm(-1) at a negative V-GS of 0.8 V and a transconductance (g(m)) of 16 mu Smm(-1), measured at room temperature (RT); at a temperature of 425 K, these values rose to similar to 70 mu Amm(-1) for /Ds and a g(m) value of 260 mu Smm(-1). In both cases, a negligible gate leakage current was measured with no breakdown apparent at the maximum field investigated here (3.7 x 10(5) V/m(-1)). The Schottky gate demonstrates a well-behaved control of the channel even at higher temperatures. The high-temperature operation, normally-(OFF) behavior, and diamond's inherent radiation hardness make this transistor promising for harsh environment applications.
引用
收藏
页码:6279 / 6285
页数:7
相关论文
共 37 条
  • [11] High Current Output Hydrogenated Diamond Triple-Gate MOSFETs
    Liu, Jiangwei
    Ohsato, Hirotaka
    Da, Bo
    Koide, Yasuo
    [J]. IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2019, 7 (01) : 561 - 565
  • [12] Low on-resistance diamond field effect transistor with high-k ZrO2 as dielectric
    Liu, Jiangwei
    Liao, Meiyong
    Imura, Masataka
    Tanaka, Akihiro
    Iwai, Hideo
    Koide, Yasuo
    [J]. SCIENTIFIC REPORTS, 2014, 4
  • [13] Reverse blocking characteristics and mechanisms in Schottky-drain AlGaN/GaN HEMT with a drain field plate and floating field plates
    Mao, Wei
    She, Wei-Bo
    Yang, Cui
    Zhang, Jin-Feng
    Zheng, Xue-Feng
    Wang, Chong
    Hao, Yue
    [J]. CHINESE PHYSICS B, 2016, 25 (01)
  • [14] Masante C, 2019, PROC INT SYMP POWER, P151, DOI 10.1109/ISPSD.2019.8757645
  • [15] SCHOTTKY DRAIN MICROWAVE GAAS FIELD-EFFECT TRANSISTORS
    MEIGNANT, D
    BOCCONGIBOD, D
    [J]. ELECTRONICS LETTERS, 1981, 17 (03) : 107 - 108
  • [16] Oxygen termination of homoepitaxial diamond surface by ozone and chemical methods: An experimental and theoretical perspective
    Navas, Javier
    Araujo, Daniel
    Carlos Piner, Jose
    Sanchez-Coronilla, Antonio
    Blanco, Eduardo
    Villar, Pilar
    Alcantara, Rodrigo
    Montserrat, Josep
    Florentin, Matthieu
    Eon, David
    Pernot, Julien
    [J]. APPLIED SURFACE SCIENCE, 2018, 433 : 408 - 418
  • [17] Characterization of vertical Mo/diamond Schottky barrier diode from non-ideal I-V and C-V measurements based on MIS model
    Nawawi, A.
    Tseng, K. J.
    Rusli
    Amaratunga, G. A. J.
    Umezawa, H.
    Shikata, S.
    [J]. DIAMOND AND RELATED MATERIALS, 2013, 35 : 1 - 6
  • [18] SI-SIO2 INTERFACE - ELECTRICAL PROPERTIES AS DETERMINED BY METAL-INSULATOR-SILICON CONDUCTANCE TECHNIQUE
    NICOLLIA.EH
    GOETZBER.A
    [J]. BELL SYSTEM TECHNICAL JOURNAL, 1967, 46 (06): : 1055 - +
  • [19] Obodovskiy I., 2019, Radiation: Fundamentals, Applications, Risks, and Safety, P247
  • [20] Comprehensive electrical analysis of metal/Al2O3/O-terminated diamond capacitance
    Pham, T. T.
    Marechal, A.
    Muret, P.
    Eon, D.
    Gheeraert, E.
    Rouger, N.
    Pernot, J.
    [J]. JOURNAL OF APPLIED PHYSICS, 2018, 123 (16)