Magnetotransport properties of electrodeposited bismuth films

被引：33

作者：

O'Brien, B. ^{[1
]}

Plaza, M. ^{[3
]}

Zhu, L. Y. ^{[2
]}

Perez, L. ^{[3
]}

Chien, C. L. ^{[2
]}

Searson, P. C. ^{[1
]}

机构：

[1] Johns Hopkins Univ, Dept Mat Sci & Engn, Baltimore, MD 21218 USA

[2] Johns Hopkins Univ, Dept Phys & Astron, Baltimore, MD 21218 USA

[3] Univ Complutense Madrid, Madrid, Spain

来源：

JOURNAL OF PHYSICAL CHEMISTRY C | 2008年 / 112卷 / 31期

关键词：

D O I：

10.1021/jp802802j

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Bismuth is a sernimetal with unusual transport properties, such as long mean free path and large magnetoresistance (MR) effect. Here we report on the influence of deposition potential, Bi(III) concentration, and thickness on the microstructure and morphology of bismuth thin films. Polycrystalline bismuth films were deposited on gold from bismuth nitrate solution. The texture of the films is strongly dependent on deposition potential and Bi(III) concentration, but only weakly dependent on film thickness. The film morphology is strongly dependent on deposition potential and on film thickness. The magnetoresistance (MR) of the as-deposited films was highly dependent film morphology and grain size. Understanding the structure-property relationships is an important first step in optimizing the transport properties of as-deposited films and patterned features.

引用

页码：12018 / 12023

页数：6

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