Synthesis of thin films using the jet nonequilibrium low pressure plasma

被引:0
|
作者
Galyautdinov, RT [1 ]
Kashapov, NF [1 ]
机构
[1] Kazan Pump Mech Res Inst, Kazan, Russia
关键词
D O I
暂无
中图分类号
V [航空、航天];
学科分类号
08 ; 0825 ;
摘要
We study SiOx and TiOx (0<x<2) thin film coatings with controllable absorption obtained using the nonequilibrium low pressure plasma. We suggest the method for constructing interference systems which is based on varying the complex part of high-frequency, dielectric permeability,, this method makes it passible to realize systems with the spectral characteristics related on the basis of two layers. Th efficiency of this method is illustrated by the example of antireflection neutral optical filters.
引用
收藏
页码:79 / 80
页数:2
相关论文
共 50 条
  • [31] Effect of the monomer TEOS flow rate on the formation of silicon dioxide films by nonequilibrium, atmospheric pressure plasma jet
    Lin, Jiang
    Zhang, Xi-Wen
    Han, Gao-Rong
    Gongneng Cailiao/Journal of Functional Materials, 2011, 42 (SUPPL. 2): : 302 - 305
  • [32] Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system
    Soukup, L.
    Sicha, M.
    Fendrych, F.
    Jastrabik, L.
    Hubicka, Z.
    Chvostova, D.
    Sichova, H.
    Valvoda, V.
    Tarasenko, A.
    Studnicka, V.
    Wagner, T.
    Novak, M.
    Surface and Coatings Technology, 1999, 116 : 321 - 326
  • [33] Low pressure plasma immobilization of thin hydrogel films on polymer surfaces
    Nitschke, M
    Zschoche, S
    Baier, A
    Simon, F
    Werner, C
    SURFACE & COATINGS TECHNOLOGY, 2004, 185 (01): : 120 - 125
  • [34] Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system
    Soukup, L
    Sícha, M
    Fendrych, F
    Jastrabík, L
    Hubicka, Z
    Chvostová, D
    Síchová, H
    Valvoda, V
    Tarasenko, A
    Studnicka, V
    Wagner, T
    Novák, M
    SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 321 - 326
  • [35] Preparation of nitrogen doped silicon oxides thin films by plasma polymerization of 3-aminopropyltriethoxylsilane using atmospheric pressure plasma jet
    Lin, Yu-Chun
    Wang, Meng-Jiy
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (01)
  • [36] Etching of DLC films using a low intensity oxygen plasma jet
    Urruchi, WI
    Massi, M
    Maciel, HS
    Otani, C
    Nishioka, LN
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 685 - 688
  • [37] Effect of poly (vinyl alcohol) (PVA) films treated by atmospheric pressure plasma jet and low-pressure plasma
    Liu Xiulan
    Peng Shujing
    Qiu Yiping
    PROCEEDINGS OF 2009 INTERNATIONAL CONFERENCE ON ADVANCED FIBERS AND POLYMER MATERIALS, VOLS 1 AND 2, 2009, : 781 - 783
  • [38] Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry
    Necas, D.
    Cudek, V.
    Vodak, J.
    Ohlidal, M.
    Klapetek, P.
    Benedikt, J.
    Ruegner, K.
    Zajickova, L.
    MEASUREMENT SCIENCE AND TECHNOLOGY, 2014, 25 (11)
  • [39] Synthesis of highly transparent ultrananocrystalline diamond films from a low-pressure, low-temperature focused microwave plasma jet
    Wen-Hsiang Liao
    Da-Hua Wei
    Chii-Ruey Lin
    Nanoscale Research Letters, 7 (1):
  • [40] One-Step synthesis of nanosized Cu-Ag films using atmospheric pressure plasma jet
    Agrotis, Stefanos
    Sener, M. Emre
    Hagger, Oliver S. J.
    Handoko, Albertus D.
    Caruana, Daren J.
    APPLIED MATERIALS TODAY, 2024, 39